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Optical microlithography XVII : 24-27 February 2004, Santa Clara, California, USA

Author: Bruce W Smith; Society of Photo-optical Instrumentation Engineers.; Semiconductor Equipment and Materials International.; International SEMATECH.; SPIE Digital Library.
Publisher: Bellingham, Wash., USA : SPIE, ©2004.
Series: Proceedings of SPIE--the International Society for Optical Engineering, v. 5377.
Edition/Format:   eBook : Document : Conference publication : EnglishView all editions and formats
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Genre/Form: Conference papers and proceedings
Congresses
Congrès
Additional Physical Format: (OCoLC)55858298
Material Type: Conference publication, Document, Internet resource
Document Type: Internet Resource, Computer File
All Authors / Contributors: Bruce W Smith; Society of Photo-optical Instrumentation Engineers.; Semiconductor Equipment and Materials International.; International SEMATECH.; SPIE Digital Library.
OCLC Number: 55978404
Reproduction Notes: Electronic reproduction. Bellingham, Wash. : SPIE--the International Society for Optical Engineering, 2004. Mode of access: World Wide Web. Access restricted to SPIE Digital Library subscribers.
Description: 3 volumes (xxiii, 1314 pages) : illustrations (some color) ; 28 cm.
Series Title: Proceedings of SPIE--the International Society for Optical Engineering, v. 5377.
Other Titles: Optical microlithography 17
Optical microlithography seventeen
Responsibility: Bruce W. Smith, chair/editor ; sponsored ... by SPIE--the International Society for Optical Engineering ; cooperating organizations, SEMI--Semiconductor Equipment and Materials International, International SEMATECH.

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