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Patent Law in Greater China.

Author: S Luginbuehl; P Ganea
Publisher: Cheltenham : Edward Elgar Publishing, 2014.
Series: Elgar Intellectual Property Law and Practice series.
Edition/Format:   eBook : Document : EnglishView all editions and formats
Summary:
'Patent Law in Greater China provides some of the most comprehensive, up-to-date and contextualized analyses of Chinese patent law. Featuring expert contributors with diverse backgrounds and deep inside knowledge, this edited volume strikes a good balance between scholarly analysis and practical tips. The book should be on the desk of everybody who handles patent-related matters in Greater China.'- Peter K. Yu,  Read more...
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Genre/Form: Electronic books
Additional Physical Format: Print version:
Material Type: Document, Internet resource
Document Type: Internet Resource, Computer File
All Authors / Contributors: S Luginbuehl; P Ganea
ISBN: 9781781954843 1781954844
OCLC Number: 890072320
Description: 1 online resource (522 pages).
Contents: pt. I. Patent protection in the People's Republic of China : general --
pt. II. Substantive patent law --
pt. III. Patent application and examination procedure --
pt. IV. Enforcement --
pt. V. Market power --
related aspects --
pt. VI. Utility model and design protection --
pt. VII. Patent protection in Chinese Taipei (Taiwan) --
pt. VIII. Patent protection in Hong Kong Sar --
pt. IX. Patent protection In Macau Sar.
Series Title: Elgar Intellectual Property Law and Practice series.

Abstract:

'Patent Law in Greater China provides some of the most comprehensive, up-to-date and contextualized analyses of Chinese patent law. Featuring expert contributors with diverse backgrounds and deep inside knowledge, this edited volume strikes a good balance between scholarly analysis and practical tips. The book should be on the desk of everybody who handles patent-related matters in Greater China.'- Peter K. Yu, Drake University Law School, USThis book provides a comprehensive introduction to patent policy, law and practice in Greater China and will be a go-to book for patent practitioners who.

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