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Photomask and next-generation lithography mask technology XI : 14-16 April, 2004, Yokohama, Japan

Author: Photomask Japan.; BACUS (Technical group); Institute of Electrical and Electronics Engineers. Japan Section.; Semiconductor Equipment and Materials International (Japan); Society of Photo-optical Instrumentation Engineers.; et al
Publisher: Bellingham, Wash. : SPIE, ©2004.
Series: Proceedings of SPIE--the International Society for Optical Engineering, v. 5446.
Edition/Format:   Print book : EnglishView all editions and formats
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Proceedings of SPIE offer access to the latest innovations in research and technology and are among the most cited references in patent literature.

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Genre/Form: Conference papers and proceedings
Congresses
Document Type: Book
All Authors / Contributors: Photomask Japan.; BACUS (Technical group); Institute of Electrical and Electronics Engineers. Japan Section.; Semiconductor Equipment and Materials International (Japan); Society of Photo-optical Instrumentation Engineers.; et al
ISBN: 0819453692 9780819453693
OCLC Number: 56430029
Notes: Some earlier proceedings have title: Photomask and X-ray mask technology.
Description: 2 volumes (xxxiii, 984 pages) : illustrations ; 28 cm.
Series Title: Proceedings of SPIE--the International Society for Optical Engineering, v. 5446.
Other Titles: Photomask and X-ray mask technology
Responsibility: Hiroyoshi Tanabe, editor ; sponsored by PMJ--Photomask Japan, BACUS--the international technical group of SPIE dedicated to the advancement of photomask technology, [and] SPIE--The International Society for Optical Engineering ; cooperating organizations, the Institute of Electrical Engineers of Japan ... (et al.) ; co-organized by Yokohama City (Japan) ; published by SPIE--The International Society for Optical Engineering.

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