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Photomask and next-generation lithography mask technology XXI : 15-17 April 2014, Yokohama, Japan

Author: Kokoro Kato; SPIE (Society),
Publisher: Bellingham, Washington : SPIE, [2014] ©2014
Series: Proceedings of SPIE--the International Society for Optical Engineering, v. 9256.
Edition/Format:   eBook : Document : Conference publication : EnglishView all editions and formats
Summary:

Proceedings of SPIE offer access to the latest innovations in research and technology and are among the most cited references in patent literature.

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Genre/Form: Conference papers and proceedings
Congresses
Additional Physical Format: Print version:
(OCoLC)897436057
Material Type: Conference publication, Document, Internet resource
Document Type: Internet Resource, Computer File
All Authors / Contributors: Kokoro Kato; SPIE (Society),
OCLC Number: 891701860
Description: 1 online resource : illustrations (some color).
Series Title: Proceedings of SPIE--the International Society for Optical Engineering, v. 9256.
Responsibility: Kokoro Kato, editor ; sponsored by PMJ Photomask Japan, BACUS, SPIE ; published by SPIE.

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Primary Entity

<http://www.worldcat.org/oclc/891701860> # Photomask and next-generation lithography mask technology XXI : 15-17 April 2014, Yokohama, Japan
    a schema:Book, schema:CreativeWork, schema:MediaObject ;
   library:oclcnum "891701860" ;
   library:placeOfPublication <http://id.loc.gov/vocabulary/countries/wau> ;
   schema:about <http://experiment.worldcat.org/entity/work/data/2995237019#Topic/optoelectronic_devices_design_and_construction> ; # Optoelectronic devices--Design and construction
   schema:about <http://experiment.worldcat.org/entity/work/data/2995237019#Topic/masks_electronics> ; # Masks (Electronics)
   schema:about <http://experiment.worldcat.org/entity/work/data/2995237019#Topic/microlithography> ; # Microlithography
   schema:about <http://experiment.worldcat.org/entity/work/data/2995237019#Topic/x_ray_lithography> ; # X-ray lithography
   schema:about <http://experiment.worldcat.org/entity/work/data/2995237019#Topic/integrated_circuits_masks> ; # Integrated circuits--Masks
   schema:bookFormat schema:EBook ;
   schema:contributor <http://experiment.worldcat.org/entity/work/data/2995237019#Organization/spie_society> ; # SPIE (Society),
   schema:copyrightYear "2014" ;
   schema:datePublished "2014" ;
   schema:editor <http://experiment.worldcat.org/entity/work/data/2995237019#Person/kato_kokoro> ; # Kokoro Kato
   schema:exampleOfWork <http://worldcat.org/entity/work/id/2995237019> ;
   schema:genre "Conference publication"@en ;
   schema:genre "Conference papers and proceedings"@en ;
   schema:inLanguage "en" ;
   schema:isPartOf <http://worldcat.org/issn/0277-786X> ; # Proceedings of SPIE--the International Society for Optical Engineering ;
   schema:isSimilarTo <http://www.worldcat.org/oclc/897436057> ;
   schema:name "Photomask and next-generation lithography mask technology XXI : 15-17 April 2014, Yokohama, Japan"@en ;
   schema:productID "891701860" ;
   schema:url <http://proceedings.spiedigitallibrary.org/volume.aspx?volume=9256&issue=1> ;
   wdrs:describedby <http://www.worldcat.org/title/-/oclc/891701860> ;
    .


Related Entities

<http://experiment.worldcat.org/entity/work/data/2995237019#Person/kato_kokoro> # Kokoro Kato
    a schema:Person ;
   schema:familyName "Kato" ;
   schema:givenName "Kokoro" ;
   schema:name "Kokoro Kato" ;
    .

<http://experiment.worldcat.org/entity/work/data/2995237019#Topic/integrated_circuits_masks> # Integrated circuits--Masks
    a schema:Intangible ;
   schema:name "Integrated circuits--Masks"@en ;
    .

<http://experiment.worldcat.org/entity/work/data/2995237019#Topic/masks_electronics> # Masks (Electronics)
    a schema:Intangible ;
   schema:name "Masks (Electronics)"@en ;
    .

<http://experiment.worldcat.org/entity/work/data/2995237019#Topic/optoelectronic_devices_design_and_construction> # Optoelectronic devices--Design and construction
    a schema:Intangible ;
   schema:name "Optoelectronic devices--Design and construction"@en ;
    .

<http://worldcat.org/issn/0277-786X> # Proceedings of SPIE--the International Society for Optical Engineering ;
    a bgn:PublicationSeries ;
   schema:hasPart <http://www.worldcat.org/oclc/891701860> ; # Photomask and next-generation lithography mask technology XXI : 15-17 April 2014, Yokohama, Japan
   schema:issn "0277-786X" ;
   schema:name "Proceedings of SPIE--the International Society for Optical Engineering ;" ;
   schema:name "Proceedings of SPIE," ;
    .

<http://www.worldcat.org/oclc/897436057>
    a schema:CreativeWork ;
   schema:description "Print version:" ;
   schema:isSimilarTo <http://www.worldcat.org/oclc/891701860> ; # Photomask and next-generation lithography mask technology XXI : 15-17 April 2014, Yokohama, Japan
    .

<http://www.worldcat.org/title/-/oclc/891701860>
    a genont:InformationResource, genont:ContentTypeGenericResource ;
   schema:about <http://www.worldcat.org/oclc/891701860> ; # Photomask and next-generation lithography mask technology XXI : 15-17 April 2014, Yokohama, Japan
   schema:dateModified "2017-12-24" ;
   void:inDataset <http://purl.oclc.org/dataset/WorldCat> ;
    .


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