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Photomask and X-ray mask technology III : 18-19 April, 1996, Kawasaki City, Kanagawa, Japan

Author: Hideo Yoshihara; Photomask Japan.; BACUS (Technical group); Society of Photo-optical Instrumentation Engineers. Japan Chapter.; Society of Photo-optical Instrumentation Engineers.
Publisher: Bellingham, Wash. : Society of Photo-optical Instrumentation Engineers, ©1996.
Series: Proceedings of SPIE--the International Society for Optical Engineering, v. 2793.
Edition/Format:   Print book : Conference publication : EnglishView all editions and formats
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Genre/Form: Conference papers and proceedings
Congresses
Material Type: Conference publication
Document Type: Book
All Authors / Contributors: Hideo Yoshihara; Photomask Japan.; BACUS (Technical group); Society of Photo-optical Instrumentation Engineers. Japan Chapter.; Society of Photo-optical Instrumentation Engineers.
ISBN: 0819421790 9780819421791
OCLC Number: 35514342
Description: xiii, 530 pages : illustrations ; 28 cm.
Contents: Photomask process and materials --
Phase-shift mask --
Masks for x ray and e-beam --
Inspection and repair --
Metrology --
Pelliclization --
Design automation --
Equipment.
Series Title: Proceedings of SPIE--the International Society for Optical Engineering, v. 2793.
Responsibility: Hideo Yoshihara, editor ; sponsored by Photomask Japan, BACUS, SPIE--the International Society for Optical Engineering.

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