skip to content
Photomask Technology 2014 : 16-18 September 2014, Monterey, California, United States Preview this item
ClosePreview this item
Checking...

Photomask Technology 2014 : 16-18 September 2014, Monterey, California, United States

Author: Paul W Ackmann; Naoya Hayashi; BACUS (Technical group),; SPIE (Society),
Publisher: Bellingham, Washington : SPIE, [2014] ©2014
Series: Proceedings of SPIE--the International Society for Optical Engineering, v. 9235.
Edition/Format:   eBook : Document : Conference publication : EnglishView all editions and formats
Summary:

Proceedings of SPIE offer access to the latest innovations in research and technology and are among the most cited references in patent literature.

Rating:

(not yet rated) 0 with reviews - Be the first.

Subjects
More like this

Find a copy online

Links to this item

Find a copy in the library

&AllPage.SpinnerRetrieving; Finding libraries that hold this item...

Details

Genre/Form: Conference papers and proceedings
Congresses
Material Type: Conference publication, Document, Internet resource
Document Type: Internet Resource, Computer File
All Authors / Contributors: Paul W Ackmann; Naoya Hayashi; BACUS (Technical group),; SPIE (Society),
OCLC Number: 893191964
Description: 1 online resource : illustrations (some color)
Series Title: Proceedings of SPIE--the International Society for Optical Engineering, v. 9235.
Responsibility: Paul W. Ackmann, Naoya Hayashi, editors ; sponsored by BACUS, SPIE ; published by SPIE.

Reviews

User-contributed reviews
Retrieving GoodReads reviews...
Retrieving DOGObooks reviews...

Tags

Be the first.
Confirm this request

You may have already requested this item. Please select Ok if you would like to proceed with this request anyway.

Linked Data


Primary Entity

<http://www.worldcat.org/oclc/893191964> # Photomask Technology 2014 : 16-18 September 2014, Monterey, California, United States
    a schema:CreativeWork, schema:MediaObject, schema:Book ;
   library:oclcnum "893191964" ;
   library:placeOfPublication <http://id.loc.gov/vocabulary/countries/wau> ;
   schema:about <http://experiment.worldcat.org/entity/work/data/2504957109#Topic/microlithography> ; # Microlithography
   schema:about <http://experiment.worldcat.org/entity/work/data/2504957109#Topic/integrated_circuits_masks> ; # Integrated circuits--Masks
   schema:about <http://experiment.worldcat.org/entity/work/data/2504957109#Topic/masks_electronics> ; # Masks (Electronics)
   schema:bookFormat schema:EBook ;
   schema:contributor <http://experiment.worldcat.org/entity/work/data/2504957109#Organization/spie_society> ; # SPIE (Society),
   schema:contributor <http://experiment.worldcat.org/entity/work/data/2504957109#Organization/bacus_technical_group> ; # BACUS (Technical group),
   schema:copyrightYear "2014" ;
   schema:datePublished "2014" ;
   schema:editor <http://experiment.worldcat.org/entity/work/data/2504957109#Person/hayashi_naoya> ; # Naoya Hayashi
   schema:editor <http://experiment.worldcat.org/entity/work/data/2504957109#Person/ackmann_paul_w> ; # Paul W. Ackmann
   schema:exampleOfWork <http://worldcat.org/entity/work/id/2504957109> ;
   schema:genre "Conference publication"@en ;
   schema:genre "Conference papers and proceedings"@en ;
   schema:inLanguage "en" ;
   schema:isPartOf <http://worldcat.org/issn/0277-786X> ; # Proceedings of SPIE--the International Society for Optical Engineering ;
   schema:name "Photomask Technology 2014 : 16-18 September 2014, Monterey, California, United States"@en ;
   schema:productID "893191964" ;
   schema:url <http://proceedings.spiedigitallibrary.org/volume.aspx?volume=9235> ;
   schema:url <http://proceedings.spiedigitallibrary.org/volume.aspx?volume=9235&issue=1> ;
   wdrs:describedby <http://www.worldcat.org/title/-/oclc/893191964> ;
    .


Related Entities

<http://experiment.worldcat.org/entity/work/data/2504957109#Organization/bacus_technical_group> # BACUS (Technical group),
    a schema:Organization ;
   schema:name "BACUS (Technical group)," ;
    .

<http://experiment.worldcat.org/entity/work/data/2504957109#Person/ackmann_paul_w> # Paul W. Ackmann
    a schema:Person ;
   schema:familyName "Ackmann" ;
   schema:givenName "Paul W." ;
   schema:name "Paul W. Ackmann" ;
    .

<http://experiment.worldcat.org/entity/work/data/2504957109#Person/hayashi_naoya> # Naoya Hayashi
    a schema:Person ;
   schema:familyName "Hayashi" ;
   schema:givenName "Naoya" ;
   schema:name "Naoya Hayashi" ;
    .

<http://experiment.worldcat.org/entity/work/data/2504957109#Topic/integrated_circuits_masks> # Integrated circuits--Masks
    a schema:Intangible ;
   schema:name "Integrated circuits--Masks"@en ;
    .

<http://experiment.worldcat.org/entity/work/data/2504957109#Topic/masks_electronics> # Masks (Electronics)
    a schema:Intangible ;
   schema:name "Masks (Electronics)"@en ;
    .

<http://worldcat.org/issn/0277-786X> # Proceedings of SPIE--the International Society for Optical Engineering ;
    a bgn:PublicationSeries ;
   schema:hasPart <http://www.worldcat.org/oclc/893191964> ; # Photomask Technology 2014 : 16-18 September 2014, Monterey, California, United States
   schema:issn "0277-786X" ;
   schema:name "Proceedings of SPIE--the International Society for Optical Engineering ;" ;
   schema:name "Proceedings of SPIE," ;
    .

<http://www.worldcat.org/title/-/oclc/893191964>
    a genont:InformationResource, genont:ContentTypeGenericResource ;
   schema:about <http://www.worldcat.org/oclc/893191964> ; # Photomask Technology 2014 : 16-18 September 2014, Monterey, California, United States
   schema:dateModified "2018-03-11" ;
   void:inDataset <http://purl.oclc.org/dataset/WorldCat> ;
    .


Content-negotiable representations

Close Window

Please sign in to WorldCat 

Don't have an account? You can easily create a free account.