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Photoresist : materials and processes

Author: William S DeForest
Publisher: New York : McGraw-Hill, [1975]
Edition/Format:   Print book : EnglishView all editions and formats
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Additional Physical Format: Online version:
DeForest, William S.
Photoresist.
New York : McGraw-Hill, [1975]
(OCoLC)602547400
Document Type: Book
All Authors / Contributors: William S DeForest
ISBN: 0070162301 9780070162303
OCLC Number: 1054407
Description: xi, 269 pages : illustrations ; 24 cm
Responsibility: W.S. DeForest.

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