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Photosensitive metal-organic systems : mechanistic principles and applications

Author: Charles Kutal; Nick Serpone; American Chemical Society. Division of Inorganic Chemistry.
Publisher: Washington, DC : American Chemical Society, 1993.
Series: Advances in chemistry series, 238.
Edition/Format:   eBook : Document : Conference publication : EnglishView all editions and formats
Database:WorldCat
Summary:

Examines the fundamental mechanistic aspects and practical applications of photocatalytic systems. This work defines important terminology and provides a tutorial covering basic mechanistic concepts.  Read more...

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Genre/Form: Electronic books
Conference papers and proceedings
Congresses
Congrès
Additional Physical Format: Print version:
Photosensitive metal-organic systems.
Washington, DC : American Chemical Society, 1993
(DLC) 93022823
(OCoLC)28221567
Material Type: Conference publication, Document, Internet resource
Document Type: Internet Resource, Computer File
All Authors / Contributors: Charles Kutal; Nick Serpone; American Chemical Society. Division of Inorganic Chemistry.
ISBN: 9780841224209 084122420X
OCLC Number: 451606186
Language Note: English.
Notes: Title from PDF title page (ACS publications, viewed Oct 7, 2009).
"Developed from a symposium sponsored by the Division of Inorganic Chemistry of the American Chemical Society."
Reproduction Notes: Electronic reproduction. [S.l.] : HathiTrust Digital Library, 2011. MiAaHDL
Description: 1 online resource (xiii, 449 pages) : illustrations.
Details: Master and use copy. Digital master created according to Benchmark for Faithful Digital Reproductions of Monographs and Serials, Version 1. Digital Library Federation, December 2002.
Contents: Photosensitive material-organic systems / Charles Kutal --
Reactive intermediates in the carbonylation of metal-alkyl bonds / Peter C. Ford, David W. Ryba, and Simon T. Belt --
Photochemical reactions of organometallic molecules on surfaces / Doris Kang, Eric W. Wollman, and Mark S. Wrighton --
Photocatalytic behavior of tungsten, iron, and ruthenium carbonyls on porous glass / Shu-Ping Xu and Harry D. Gafney --
Metal-organic photochemistry in the millisecond-to-picosecond time domain / G. Ferraudi --
Photosensitized reduction of alkyl and aryl halides using Ru(II) diimine complexes / William F. Wacholtz [and others] --
Photochemistry and redox catalysis using rhenium and molybdenum complexes / Andrew W. Maverick [and others] --
Photoredox chemistry of d4 bimetallic systems / Colleen M. Partigianoni [and others]. Patterned imaging of palladium and platinum films / Clifford P. Kubiak [and others] --
Photoinduced electron-transfer reactions between excited transition metal complexes and redox sites in enzymes / Itamar Willner and Noa Lapidot --
Luminescence probes of DNA-binding interactions involving copper complexes / David R. McMillin [and others] --
Molecular models for semiconductor particles / Thomas Türk, Arnd Vogler, and Marye Anne Fox --
Polyoxometalates in catalytic photochemical hydrocarbon functionalization and photomicrolithography / Craig L. Hill [and others] --
Photoredox chemistry of metal complexes in microheterogeneous media / Robin Cowdery-Corvan [and others] --
Heterogeneous photocatalyzed oxidation of phenol, cresols, and fluorophenols in TiO₂ aqueous suspensions / Nick Serpone [and others]. Homogeneous metal-catalyzed photochemistry in organic synthesis / Robert G. Salomon, Subrata Ghosh, and Swadesh Raychaudhuri --
Photooxidation of metal carbynes / Lisa McElwee-White, Kevin B. Kingsbury, and John D. Carter --
Photocatalysis induced by light-sensitive coordination compounds / Horst Hennig, Lutz Weber, and Detlef Rehorek --
Photoredox reactivity of copper complexes and photooxidation of organic substrates / Ján Sýkora, Eva Brands̆terová, and Adriana Jabconová --
Light-sensitive organometallic compounds in photopolymerization / Achim Roloff --
Photoinitiator activity, electrochemistry, and spectroscopy of cationic organometallic compounds / W.A. hendrickson and M.C. Palazzotto.
Series Title: Advances in chemistry series, 238.
Responsibility: [editors], Charles Kutal, Nick Serpone.

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