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Plasma etching : fundamentals and applications

Author: M Sugawara; Barry L Stansfield
Publisher: New York : Oxford University Press, 1998.
Series: Series on semiconductor science and technology, 7.
Edition/Format:   Print book : EnglishView all editions and formats
Summary:

The focus of this book is the remarkable advances in understanding of low pressure RF (radio frequency) glow discharges. A basic analytical theory and plasma physics are explained. Plasma  Read more...

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Material Type: Internet resource
Document Type: Book, Internet Resource
All Authors / Contributors: M Sugawara; Barry L Stansfield
ISBN: 019856287X 9780198562870
OCLC Number: 37917287
Description: viii, 347 pages : illustrations (some color) ; 24 cm.
Contents: 1. Introduction ; 2. RF discharges ; 3. Physical basis of plasma etching process ; 4. Diagnostics of plasma particles and potentials ; 5. Technology of reactive ion etching ; 6. Magnetic field coupled etchers ; 7. ECR plasma etchers ; 8. Future propects ; Index
Series Title: Series on semiconductor science and technology, 7.
Responsibility: M. Sugawara ; with contributions from Barry L. Stonsfield [and others].
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