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Plasma sources for thin film deposition and etching

Author: Maurice H Francombe; John L Vossen
Publisher: San Diego, CA. : Academic Press, 1994.
Series: Physics of thin films, v. 18.
Edition/Format:   Print book : Conference publication : EnglishView all editions and formats
Summary:

Includes four chapters that discuss high-density plasma sources for materials processing, electron cyclotron resonance and its uses, unbalanced magnetron sputtering, and particle formation in thin  Read more...

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Material Type: Conference publication, Internet resource
Document Type: Book, Internet Resource
All Authors / Contributors: Maurice H Francombe; John L Vossen
ISBN: 0125330189 9780125330183
OCLC Number: 31414635
Description: xiii, 397 pages : illustrations ; 24 cm.
Contents: Design of high-density plasma sources for materials processing --
Electron cyclotron resonance plasma sources and their use in plasma-assisted chemical vapor depositin of thin films --
Unbalanced magnetron sputtering --
The formation of particles in thin-film processing plasmas.
Series Title: Physics of thin films, v. 18.
Responsibility: edited by Maurice H. Francombe, John L. Vossen.

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