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| Additional Physical Format: | Online version: Ctein. Post exposure. Boston, MA : Focal Press, 2000 (OCoLC)606468102 |
|---|---|
| Material Type: | Internet resource |
| Document Type: | Book, Internet Resource |
| All Authors / Contributors: |
Ctein. |
| ISBN: | 0240804376 9780240804378 |
| OCLC Number: | 44727997 |
| Notes: | Includes index. |
| Description: | xiv, 178 p. : ill. (some col.) ; 28 cm. |
| Responsibility: | Ctein. |
| More information: |
Abstract:
"Post Exposure, Second Edition introduces photographers to the underlying principles as well as the practices needed to produce truly excellent photography prints. Distilled from over 30 years' experience and addressing both black-and-white and color printing, it teaches photographers the refinements of photographic printmaking, taking them from making merely competent prints to making excellent ones. The book provides clear explanations of principles and theory, but the focus is on practical techniques and examples of fine printmaking." "This new edition has been expanded and updated to provide the reader with even more insights into achieving quality prints. The book now includes: a section on the differences in producing prints with various enlarger heads; and updated "Tricks of the Trade" chapter, covering safelight fogging, adequate wash steps in reversal print processing, and using litho film masks for dodging and burning-in: and new coverage on split-filter printing and the use of Sistan, as well as over 30 additional illustrations."--Jacket.
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