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Principles of chemical vapor deposition

Author: Daniel Mark Dobkin; Michael K Zuraw
Publisher: Dordrecht ; Boston : Kluwer Academic Publishers, 2003.
Edition/Format:   Print book : EnglishView all editions and formats
Summary:

This book will assist workers new to chemical vapor deposition (CVD) to understand CVD reactors and processes and to comprehend and exploit the literature in the field.

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Material Type: Internet resource
Document Type: Book, Internet Resource
All Authors / Contributors: Daniel Mark Dobkin; Michael K Zuraw
ISBN: 1402012489 9781402012488
OCLC Number: 52058209
Description: xi, 273 pages : illustrations ; 25 cm
Contents: Part 1: Introduction --
Part 2: Reactors without transport --
Part 3: Mass transport --
Part 4: Heat transport --
Part 5: Chemistry for CVD --
Part 6: Gas discharge plasmas for CVD --
7. CVD films --
8. CVD reactors.
Responsibility: by Daniel M. Dobkin and Michael K. Zuraw.
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