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Principles of physical vapor deposition of thin films

Author: K S SreeHarsha
Publisher: Amsterdam ; Boston ; London : Elsevier, 2006.
Edition/Format:   eBook : Document : English : 1st edView all editions and formats
Database:WorldCat
Summary:
The goal of producing devices that are smaller, faster, more functional, reproducible, reliable and economical has given thin film processing a unique role in technology. Principles of Vapor Deposition of Thin Films brings in to one place a diverse amount of scientific background that is considered essential to become knowledgeable in thin film depostition techniques. Its ultimate goal as a reference is to provide  Read more...
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Genre/Form: Electronic books
Additional Physical Format: Print version:
SreeHarsha, K.S.
Principles of physical vapor deposition of thin films.
Amsterdam ; Boston ; London : Elsevier, 2006
(DLC) 2005937842
(OCoLC)61217411
Material Type: Document, Internet resource
Document Type: Internet Resource, Computer File
All Authors / Contributors: K S SreeHarsha
ISBN: 9780080446998 008044699X 9780080480312 0080480314
OCLC Number: 162568390
Description: 1 online resource (xi, 1160 pages) : illustrations
Contents: Introduction --
Evaporation --
Plasma state --
Cold plasma discharges --
Thermal evaporation sources --
Gas glow in thin film processing systems --
Special sources --
Gas solid interactions --
Nucleation and growth of films --
Epitaxy --
Substrate preparation --
Structure and properties of films --
Dry etching.
Responsibility: K.S. Sree Harsha.
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Abstract:

The goal of producing devices that are smaller, faster, and more functional has given thin film processing a unique role in technology. This work aims to provide the foundation upon which thin film  Read more...

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