skip to content
Principles of plasma discharges and materials processing Preview this item
ClosePreview this item
Checking...

Principles of plasma discharges and materials processing

Author: M A Lieberman; Allan J Lichtenberg
Publisher: Hoboken, N.J. : Wiley-Interscience, ©2005.
Edition/Format:   Print book : English : 2nd edView all editions and formats
Summary:
"The first edition of Principles of Plasma Discharges and Materials Processing, published over a decade ago, was lauded for its complete treatment of both basic plasma physics and industrial plasma processing, quickly becoming the primary reference for students and professionals." "The Second Edition has been carefully updated and revised to reflect recent developments in the field and to further clarify the
Rating:

(not yet rated) 0 with reviews - Be the first.

Subjects
More like this

Find a copy online

Links to this item

Find a copy in the library

&AllPage.SpinnerRetrieving; Finding libraries that hold this item...

Details

Material Type: Internet resource
Document Type: Book, Internet Resource
All Authors / Contributors: M A Lieberman; Allan J Lichtenberg
ISBN: 0471720011 9780471720010
OCLC Number: 56752658
Description: xxxv, 757 pages : illustrations ; 25 cm
Contents: Basic plasma equations and equilibrium --
Atomic collisions --
Plasma dynamics --
Diffusion and transport --
Direct current (DC) sheaths --
Chemical reactions and equilibrium --
Molecular collisions --
Chemical kinetics and surface processes --
Particle and energy balance in discharges --
Capacitive discharges --
Inductive discharges --
Wave-heated discharges --
Direct current (DC) discharges --
Etching --
Deposition and implantation --
Dusty plasmas --
Kinetic theory of discharges.
Responsibility: Michael A. Lieberman, Allan J. Lichtenberg.
More information:

Abstract:

This Second Edition of Principles of Plasma Discharges and Materials Processing is a thorough revision and updating of the very well received first edition of this text.  Read more...

Reviews

Editorial reviews

Publisher Synopsis

"The authors have done an excellent job...this is a good book for an academic course that will provide the foundation to senior-level and graduate students..." (MRS Bulletin, November2005)

 
User-contributed reviews
Retrieving GoodReads reviews...
Retrieving DOGObooks reviews...

Tags

Be the first.
Confirm this request

You may have already requested this item. Please select Ok if you would like to proceed with this request anyway.

Linked Data


Primary Entity

<http://www.worldcat.org/oclc/56752658> # Principles of plasma discharges and materials processing
    a schema:Book, schema:CreativeWork ;
    library:oclcnum "56752658" ;
    library:placeOfPublication <http://experiment.worldcat.org/entity/work/data/15366#Place/hoboken_n_j> ; # Hoboken, N.J.
    library:placeOfPublication <http://id.loc.gov/vocabulary/countries/nju> ;
    schema:about <http://id.loc.gov/authorities/subjects/sh85103060> ; # Plasma chemistry--Industrial applications
    schema:about <http://id.worldcat.org/fast/1066293> ; # Plasma chemistry--Industrial applications
    schema:about <http://experiment.worldcat.org/entity/work/data/15366#Topic/festkorperoberflache> ; # Festkörperoberfläche
    schema:about <http://experiment.worldcat.org/entity/work/data/15366#Topic/niederdruckplasma> ; # Niederdruckplasma
    schema:about <http://dewey.info/class/530.44/e22/> ;
    schema:about <http://id.worldcat.org/fast/1066327> ; # Plasma etching
    schema:about <http://experiment.worldcat.org/entity/work/data/15366#Topic/plasmadynamik> ; # Plasmadynamik
    schema:about <http://experiment.worldcat.org/entity/work/data/15366#Topic/plasmaerzeugung> ; # Plasmaerzeugung
    schema:about <http://experiment.worldcat.org/entity/work/data/15366#Topic/plasmachemie> ; # Plasmachemie
    schema:about <http://experiment.worldcat.org/entity/work/data/15366#Topic/dunne_schicht> ; # Dünne Schicht
    schema:about <http://id.worldcat.org/fast/1150040> ; # Thin films--Surfaces
    schema:about <http://id.worldcat.org/fast/1066317> ; # Plasma dynamics
    schema:about <http://experiment.worldcat.org/entity/work/data/15366#Topic/dunnschichttechnik> ; # Dünnschichttechnik
    schema:about <http://experiment.worldcat.org/entity/work/data/15366#Topic/plasmaatzen> ; # Plasmaätzen
    schema:about <http://experiment.worldcat.org/entity/work/data/15366#Topic/thin_films_surfaces> ; # Thin films--Surfaces
    schema:bookEdition "2nd ed." ;
    schema:bookFormat bgn:PrintBook ;
    schema:contributor <http://viaf.org/viaf/76416498> ; # Allan J. Lichtenberg
    schema:copyrightYear "2005" ;
    schema:creator <http://viaf.org/viaf/2803333> ; # Michael A. Lieberman
    schema:datePublished "2005" ;
    schema:description ""With new chapters on dusty plasmas and the kinetic theory of discharges, graduate students and researchers in the field of plasma processing should find this new edition more valuable than ever."--Jacket."@en ;
    schema:description "Basic plasma equations and equilibrium -- Atomic collisions -- Plasma dynamics -- Diffusion and transport -- Direct current (DC) sheaths -- Chemical reactions and equilibrium -- Molecular collisions -- Chemical kinetics and surface processes -- Particle and energy balance in discharges -- Capacitive discharges -- Inductive discharges -- Wave-heated discharges -- Direct current (DC) discharges -- Etching -- Deposition and implantation -- Dusty plasmas -- Kinetic theory of discharges."@en ;
    schema:exampleOfWork <http://worldcat.org/entity/work/id/15366> ;
    schema:inLanguage "en" ;
    schema:name "Principles of plasma discharges and materials processing"@en ;
    schema:productID "56752658" ;
    schema:publication <http://www.worldcat.org/title/-/oclc/56752658#PublicationEvent/hoboken_n_j_wiley_interscience_2005> ;
    schema:publisher <http://experiment.worldcat.org/entity/work/data/15366#Agent/wiley_interscience> ; # Wiley-Interscience
    schema:reviews <http://www.worldcat.org/title/-/oclc/56752658#Review/-1534185541> ;
    schema:url <http://catdir.loc.gov/catdir/enhancements/fy0618/2004058503-t.html> ;
    schema:url <http://swbplus.bsz-bw.de/bsz117343919cov.htm> ;
    schema:url <http://www3.interscience.wiley.com/cgi-bin/homepage/?isbn=9780471724254> ;
    schema:workExample <http://worldcat.org/isbn/9780471720010> ;
    umbel:isLike <http://bnb.data.bl.uk/id/resource/GBA509182> ;
    wdrs:describedby <http://www.worldcat.org/title/-/oclc/56752658> ;
    .


Related Entities

<http://experiment.worldcat.org/entity/work/data/15366#Agent/wiley_interscience> # Wiley-Interscience
    a bgn:Agent ;
    schema:name "Wiley-Interscience" ;
    .

<http://experiment.worldcat.org/entity/work/data/15366#Place/hoboken_n_j> # Hoboken, N.J.
    a schema:Place ;
    schema:name "Hoboken, N.J." ;
    .

<http://experiment.worldcat.org/entity/work/data/15366#Topic/dunne_schicht> # Dünne Schicht
    a schema:Intangible ;
    schema:name "Dünne Schicht"@en ;
    .

<http://experiment.worldcat.org/entity/work/data/15366#Topic/dunnschichttechnik> # Dünnschichttechnik
    a schema:Intangible ;
    schema:name "Dünnschichttechnik"@en ;
    .

<http://experiment.worldcat.org/entity/work/data/15366#Topic/festkorperoberflache> # Festkörperoberfläche
    a schema:Intangible ;
    schema:name "Festkörperoberfläche"@en ;
    .

<http://experiment.worldcat.org/entity/work/data/15366#Topic/niederdruckplasma> # Niederdruckplasma
    a schema:Intangible ;
    schema:name "Niederdruckplasma"@en ;
    .

<http://experiment.worldcat.org/entity/work/data/15366#Topic/plasmaerzeugung> # Plasmaerzeugung
    a schema:Intangible ;
    schema:name "Plasmaerzeugung"@en ;
    .

<http://id.loc.gov/authorities/subjects/sh85103060> # Plasma chemistry--Industrial applications
    a schema:Intangible ;
    schema:name "Plasma chemistry--Industrial applications"@en ;
    .

<http://id.worldcat.org/fast/1066293> # Plasma chemistry--Industrial applications
    a schema:Intangible ;
    schema:name "Plasma chemistry--Industrial applications"@en ;
    .

<http://id.worldcat.org/fast/1066317> # Plasma dynamics
    a schema:Intangible ;
    schema:name "Plasma dynamics"@en ;
    .

<http://id.worldcat.org/fast/1066327> # Plasma etching
    a schema:Intangible ;
    schema:name "Plasma etching"@en ;
    .

<http://id.worldcat.org/fast/1150040> # Thin films--Surfaces
    a schema:Intangible ;
    schema:name "Thin films--Surfaces"@en ;
    .

<http://viaf.org/viaf/2803333> # Michael A. Lieberman
    a schema:Person ;
    schema:familyName "Lieberman" ;
    schema:givenName "Michael A." ;
    schema:givenName "M. A." ;
    schema:name "Michael A. Lieberman" ;
    .

<http://viaf.org/viaf/76416498> # Allan J. Lichtenberg
    a schema:Person ;
    schema:familyName "Lichtenberg" ;
    schema:givenName "Allan J." ;
    schema:name "Allan J. Lichtenberg" ;
    .

<http://worldcat.org/isbn/9780471720010>
    a schema:ProductModel ;
    schema:isbn "0471720011" ;
    schema:isbn "9780471720010" ;
    .

<http://www.worldcat.org/title/-/oclc/56752658#Review/-1534185541>
    a schema:Review ;
    schema:itemReviewed <http://www.worldcat.org/oclc/56752658> ; # Principles of plasma discharges and materials processing
    schema:reviewBody ""The first edition of Principles of Plasma Discharges and Materials Processing, published over a decade ago, was lauded for its complete treatment of both basic plasma physics and industrial plasma processing, quickly becoming the primary reference for students and professionals." "The Second Edition has been carefully updated and revised to reflect recent developments in the field and to further clarify the presentation of basic principles. Along with in-depth coverage of the fundamentals of plasma physics and chemistry, the authors apply basic theory to plasma discharges, including calculations of plasma parameters and the scaling of plasma parameters with control parameters."" ;
    .


Content-negotiable representations

Close Window

Please sign in to WorldCat 

Don't have an account? You can easily create a free account.