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Principles of plasma discharges and materials processing

Author: M A Lieberman; Allan J Lichtenberg
Publisher: Hoboken, N.J. : Wiley-Interscience, ©2005.
Edition/Format:   eBook : Document : English : 2nd edView all editions and formats
Summary:
"The first edition of Principles of Plasma Discharges and Materials Processing, published over a decade ago, was lauded for its complete treatment of both basic plasma physics and industrial plasma processing, quickly becoming the primary reference for students and professionals." "The Second Edition has been carefully updated and revised to reflect recent developments in the field and to further clarify the  Read more...
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Genre/Form: Electronic books
Additional Physical Format: Print version:
Lieberman, M.A. (Michael A.).
Principles of plasma discharges and materials processing.
Hoboken, N.J. : Wiley-Interscience, ©2005
(DLC) 2004058503
(OCoLC)56752658
Material Type: Document, Internet resource
Document Type: Internet Resource, Computer File
All Authors / Contributors: M A Lieberman; Allan J Lichtenberg
ISBN: 0471724246 9780471724247 9780471720010 0471720011 0471724254 9780471724254
OCLC Number: 59760348
Description: 1 online resource (xxxv, 757 pages) : illustrations
Contents: Basic plasma equations and equilibrium --
Atomic collisions --
Plasma dynamics --
Diffusion and transport --
Direct current (DC) sheaths --
Chemical reactions and equilibrium --
Molecular collisions --
Chemical kinetics and surface processes --
Particle and energy balance in discharges --
Capacitive discharges --
Inductive discharges --
Wave-heated discharges --
Direct current (DC) discharges --
Etching --
Deposition and implantation --
Dusty plasmas --
Kinetic theory of discharges.
Responsibility: Michael A. Lieberman, Allan J. Lichtenberg.
More information:

Abstract:

"The first edition of Principles of Plasma Discharges and Materials Processing, published over a decade ago, was lauded for its complete treatment of both basic plasma physics and industrial plasma processing, quickly becoming the primary reference for students and professionals." "The Second Edition has been carefully updated and revised to reflect recent developments in the field and to further clarify the presentation of basic principles. Along with in-depth coverage of the fundamentals of plasma physics and chemistry, the authors apply basic theory to plasma discharges, including calculations of plasma parameters and the scaling of plasma parameters with control parameters." "With new chapters on dusty plasmas and the kinetic theory of discharges, graduate students and researchers in the field of plasma processing should find this new edition more valuable than ever."--Jacket.

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"The authors have done an excellent job... this is a good book for an academic course that will provide the foundation to senior-level and graduate students... " ("MRS Bulletin," November2005) "The Read more...

 
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