skip to content
Proceedings of the Symposium on Diagnostic Techniques for Semiconductor Materials and Devices Preview this item
ClosePreview this item
Checking...

Proceedings of the Symposium on Diagnostic Techniques for Semiconductor Materials and Devices

Author: Dieter K Schroder; J L Benton; P Rai-Choudhury
Publisher: Pennington, NJ : Electrochemical Society, ©1994.
Series: Proceedings (Electrochemical Society), v. 94-33.
Edition/Format:   Print book : Conference publication : EnglishView all editions and formats
Rating:

(not yet rated) 0 with reviews - Be the first.

Subjects
More like this

 

Find a copy in the library

&AllPage.SpinnerRetrieving; Finding libraries that hold this item...

Details

Genre/Form: Conference papers and proceedings
Miami Beach (Fla., 1994)
Congresses
Material Type: Conference publication
Document Type: Book
All Authors / Contributors: Dieter K Schroder; J L Benton; P Rai-Choudhury
ISBN: 1566770920 9781566770927
OCLC Number: 32389560
Description: xi, 387 pages : illustrations ; 23 cm.
Contents: MOS characterization --
Electrical characterization of ion implant charging / T.C. Smith --
Non-idealities in the characterization of thin SiO₂ films using capacitance-voltage techniques / K.S. Krisch, J. Bude, L. Manchanda --
Gaussian distribution of Si-SiO₂ barrier heights / D. Babic, E.H. Nicollian --
In Situ charactization of si gate oxides by AC impedance measurements / J.A. Bardwell, P. Schmuki, H. Bohni --
Comparison of oxide breakdown mechanism due to d-defects and oxygen precipitates / J.G. Park, S. Ushio, H. Takeno [and others] --
Doping and resistivity characterization --
Issues in two-dimensional doping profiling / R. Subrahmanyan, M. Duane --
Characterization of ion-implanted and gas-diffused base layers in ultra-high speed BJTs using advanced spreading resistance profiling and analysis / S.R. Weinzierl, R.J. Hilliard, J.M. Heddleson [and others] --
Resistivity mapping of wafers using applied current tomography / F. Djamdji, I.C. Mayes, S.R. Blight [and others] --
Lifetime characterization --
An AC surface photovoltage diagnostic technique for nondestructive detection of metallic contaminants in silicon wafrers / H. Shimizu, C. Munukata --
Effect of iron and iron complexes on the minority carrier lifetime in B, Al, and P doped silicon / K. Mishra, M. Banan, J. Moody [and others] --
Oxide etch induced silicon damage evaluation using minority carrier lifetime / M. Weling, C. Gabriel --
Correlation between minority carrier lifetime and diffusion coefficient in cast polycrystalline silicon wafers / E. Suzuki, K. Tamura, K. Onishe [and others] --
Surface photovoltage characterization of heavy metal contamination and wafer cleaning efficiency in wet chemical processes / J.J. Rosato, R.M. Hall, T.B. Parry [and others] --
Contactless microwave lifetime studies of shallow traps in semiconductor thin films and crystals / S.Y. Grabtchak, M. Cocivera --
Electromigration failure of Al alloy integrated circuit metallizations / A.S. Oates --
Optical characterization --
Rapid scan spectral ellipsometry for in situ real-time wafer state monitoring / W.M. Duncan, S.A. Henck, J.W. Kuehne [and others] --
New applications of ellipsometry for materials characterization and VLSI device process control / N. Blayo, A. Grevoz, J.T.C. Lee [and others] --
Raman spectroscopy as a diagnostic technique for semiconductor materials and devices / J. Menendez, G.S. Spencer, G. Loechelt --
Countless electromodulation for the characterization of semiconductor device structures / F.H. Pollack, H. Qiang, D. Yan [and others] --
A comparison of infrared reflectance spectroscopy and spectroscopic ellipsometry for polysilicon film process control / R. Caprio, B. Fowler, D.G. Simmons [and others] --
The measurement of submicron epitaxial layer thickness and free carrier concentration by infrared reflectance spectroscopy / B.W. Fowler, D.G. Simmons, R.A. Carpio [and others] --
The relative sensitivity to dislocation loops in silicon of brightfield interferometric profiling / H. Siriwandane, J.C. Holzer, D.E. Hill [and others] --
In situ chemical concentration monitoring and control of HF oxide etch processes / P.G. Lindquist, J.N. Butler, T.D. Jarvis [and others] --
Effects of process parameters on the defect formation in SOI-ZMR / S.-W. Lee, S.-K. Joo --
Electron, ion beam, x-ray and AFM charactization --
Beam characterization techniques for ULSI / T.J. Shaffner --
Role of electron microscopy in VLSI technology / Y.O. Kim --
Total reflection x-ray fluorescence spectroscopy: analysis of semiconductor materials / L.A. Files, T. Orent, M. Hammerbacher [and others] --
Measurement of (111) Al plane in Al-1%Si-0.5%Cu layers by image plane glancing angle x-ray diffraction technique / T. Hara, T. Okuda, K. Shinada [and others] --
Molecule free SIMS for semiconductors / J.M. Anthony, F.D. McDaniel, and G.S. Higashi --
AFM characterization of semiconductor materials and devices / K.J. Hanson, J. Sapjeta, G.S. Higashi --
Effect of cleaning on metallic contamination and surface roughness / P. Karn, A. Genis, C. Jacobs [and others].
Series Title: Proceedings (Electrochemical Society), v. 94-33.
Other Titles: Diagnostic techniques for semiconductor materials and devices
Responsibility: editors, D.K. Schroder, J.L. Benton, P. Rai-Choudhury.

Reviews

User-contributed reviews
Retrieving GoodReads reviews...
Retrieving DOGObooks reviews...

Tags

Be the first.
Confirm this request

You may have already requested this item. Please select Ok if you would like to proceed with this request anyway.

Linked Data


Primary Entity

<http://www.worldcat.org/oclc/32389560> # Proceedings of the Symposium on Diagnostic Techniques for Semiconductor Materials and Devices
    a schema:CreativeWork, schema:Book ;
   library:oclcnum "32389560" ;
   library:placeOfPublication <http://id.loc.gov/vocabulary/countries/nju> ;
   library:placeOfPublication <http://experiment.worldcat.org/entity/work/data/353430160#Place/pennington_nj> ; # Pennington, NJ
   schema:about <http://experiment.worldcat.org/entity/work/data/353430160#Topic/semiconducteurs_essais> ; # Semiconducteurs--Essais
   schema:about <http://dewey.info/class/621.381520287/e20/> ;
   schema:about <http://experiment.worldcat.org/entity/work/data/353430160#Topic/kongress> ; # Kongress
   schema:about <http://experiment.worldcat.org/entity/work/data/353430160#Topic/werkstoffprufung> ; # Werkstoffprüfung
   schema:about <http://experiment.worldcat.org/entity/work/data/353430160#Topic/semiconductors_testing> ; # Semiconductors--Testing
   schema:about <http://experiment.worldcat.org/entity/work/data/353430160#Topic/halbleiterbauelement> ; # Halbleiterbauelement
   schema:about <http://id.worldcat.org/fast/1112261> ; # Semiconductors--Testing
   schema:alternateName "Diagnostic techniques for semiconductor materials and devices" ;
   schema:bookFormat bgn:PrintBook ;
   schema:contributor <http://experiment.worldcat.org/entity/work/data/353430160#Person/rai_choudhury_p> ; # P. Rai-Choudhury
   schema:contributor <http://viaf.org/viaf/33653614> ; # Janet L. Benton
   schema:contributor <http://experiment.worldcat.org/entity/work/data/353430160#Person/schroder_dieter_k> ; # Dieter K. Schroder
   schema:copyrightYear "1994" ;
   schema:creator <http://experiment.worldcat.org/entity/work/data/353430160#Meeting/symposium_on_diagnostic_techniques_for_semiconductor_materials_and_devices_3rd_1994_miami_beach_fla> ; # Symposium on Diagnostic Techniques for Semiconductor Materials and Devices (3rd : 1994 : Miami Beach, Fla.)
   schema:datePublished "1994" ;
   schema:description "MOS characterization -- Electrical characterization of ion implant charging / T.C. Smith -- Non-idealities in the characterization of thin SiO₂ films using capacitance-voltage techniques / K.S. Krisch, J. Bude, L. Manchanda -- Gaussian distribution of Si-SiO₂ barrier heights / D. Babic, E.H. Nicollian -- In Situ charactization of si gate oxides by AC impedance measurements / J.A. Bardwell, P. Schmuki, H. Bohni -- Comparison of oxide breakdown mechanism due to d-defects and oxygen precipitates / J.G. Park, S. Ushio, H. Takeno [and others] -- Doping and resistivity characterization -- Issues in two-dimensional doping profiling / R. Subrahmanyan, M. Duane -- Characterization of ion-implanted and gas-diffused base layers in ultra-high speed BJTs using advanced spreading resistance profiling and analysis / S.R. Weinzierl, R.J. Hilliard, J.M. Heddleson [and others] -- Resistivity mapping of wafers using applied current tomography / F. Djamdji, I.C. Mayes, S.R. Blight [and others] -- Lifetime characterization -- An AC surface photovoltage diagnostic technique for nondestructive detection of metallic contaminants in silicon wafrers / H. Shimizu, C. Munukata -- Effect of iron and iron complexes on the minority carrier lifetime in B, Al, and P doped silicon / K. Mishra, M. Banan, J. Moody [and others] -- Oxide etch induced silicon damage evaluation using minority carrier lifetime / M. Weling, C. Gabriel -- Correlation between minority carrier lifetime and diffusion coefficient in cast polycrystalline silicon wafers / E. Suzuki, K. Tamura, K. Onishe [and others] -- Surface photovoltage characterization of heavy metal contamination and wafer cleaning efficiency in wet chemical processes / J.J. Rosato, R.M. Hall, T.B. Parry [and others] -- Contactless microwave lifetime studies of shallow traps in semiconductor thin films and crystals / S.Y. Grabtchak, M. Cocivera -- Electromigration failure of Al alloy integrated circuit metallizations / A.S. Oates -- Optical characterization -- Rapid scan spectral ellipsometry for in situ real-time wafer state monitoring / W.M. Duncan, S.A. Henck, J.W. Kuehne [and others] -- New applications of ellipsometry for materials characterization and VLSI device process control / N. Blayo, A. Grevoz, J.T.C. Lee [and others] -- Raman spectroscopy as a diagnostic technique for semiconductor materials and devices / J. Menendez, G.S. Spencer, G. Loechelt -- Countless electromodulation for the characterization of semiconductor device structures / F.H. Pollack, H. Qiang, D. Yan [and others] -- A comparison of infrared reflectance spectroscopy and spectroscopic ellipsometry for polysilicon film process control / R. Caprio, B. Fowler, D.G. Simmons [and others] -- The measurement of submicron epitaxial layer thickness and free carrier concentration by infrared reflectance spectroscopy / B.W. Fowler, D.G. Simmons, R.A. Carpio [and others] -- The relative sensitivity to dislocation loops in silicon of brightfield interferometric profiling / H. Siriwandane, J.C. Holzer, D.E. Hill [and others] -- In situ chemical concentration monitoring and control of HF oxide etch processes / P.G. Lindquist, J.N. Butler, T.D. Jarvis [and others] -- Effects of process parameters on the defect formation in SOI-ZMR / S.-W. Lee, S.-K. Joo -- Electron, ion beam, x-ray and AFM charactization -- Beam characterization techniques for ULSI / T.J. Shaffner -- Role of electron microscopy in VLSI technology / Y.O. Kim -- Total reflection x-ray fluorescence spectroscopy: analysis of semiconductor materials / L.A. Files, T. Orent, M. Hammerbacher [and others] -- Measurement of (111) Al plane in Al-1%Si-0.5%Cu layers by image plane glancing angle x-ray diffraction technique / T. Hara, T. Okuda, K. Shinada [and others] -- Molecule free SIMS for semiconductors / J.M. Anthony, F.D. McDaniel, and G.S. Higashi -- AFM characterization of semiconductor materials and devices / K.J. Hanson, J. Sapjeta, G.S. Higashi -- Effect of cleaning on metallic contamination and surface roughness / P. Karn, A. Genis, C. Jacobs [and others]."@en ;
   schema:exampleOfWork <http://worldcat.org/entity/work/id/353430160> ;
   schema:genre "Conference papers and proceedings"@en ;
   schema:genre "Miami Beach (Fla., 1994)"@en ;
   schema:genre "Conference publication"@en ;
   schema:inLanguage "en" ;
   schema:isPartOf <http://experiment.worldcat.org/entity/work/data/353430160#Series/proceedings_electrochemical_society> ; # Proceedings (Electrochemical Society) ;
   schema:name "Proceedings of the Symposium on Diagnostic Techniques for Semiconductor Materials and Devices"@en ;
   schema:productID "32389560" ;
   schema:publication <http://www.worldcat.org/title/-/oclc/32389560#PublicationEvent/pennington_nj_electrochemical_society_1994> ;
   schema:publisher <http://experiment.worldcat.org/entity/work/data/353430160#Agent/electrochemical_society> ; # Electrochemical Society
   schema:workExample <http://worldcat.org/isbn/9781566770927> ;
   wdrs:describedby <http://www.worldcat.org/title/-/oclc/32389560> ;
    .


Related Entities

<http://experiment.worldcat.org/entity/work/data/353430160#Agent/electrochemical_society> # Electrochemical Society
    a bgn:Agent ;
   schema:name "Electrochemical Society" ;
    .

<http://experiment.worldcat.org/entity/work/data/353430160#Meeting/symposium_on_diagnostic_techniques_for_semiconductor_materials_and_devices_3rd_1994_miami_beach_fla> # Symposium on Diagnostic Techniques for Semiconductor Materials and Devices (3rd : 1994 : Miami Beach, Fla.)
    a bgn:Meeting, schema:Event ;
   schema:location <http://experiment.worldcat.org/entity/work/data/353430160#Place/miami_beach_fla> ; # Miami Beach, Fla.)
   schema:name "Symposium on Diagnostic Techniques for Semiconductor Materials and Devices (3rd : 1994 : Miami Beach, Fla.)" ;
    .

<http://experiment.worldcat.org/entity/work/data/353430160#Person/rai_choudhury_p> # P. Rai-Choudhury
    a schema:Person ;
   schema:familyName "Rai-Choudhury" ;
   schema:givenName "P." ;
   schema:name "P. Rai-Choudhury" ;
    .

<http://experiment.worldcat.org/entity/work/data/353430160#Person/schroder_dieter_k> # Dieter K. Schroder
    a schema:Person ;
   schema:familyName "Schroder" ;
   schema:givenName "Dieter K." ;
   schema:name "Dieter K. Schroder" ;
    .

<http://experiment.worldcat.org/entity/work/data/353430160#Place/miami_beach_fla> # Miami Beach, Fla.)
    a schema:Place ;
   schema:name "Miami Beach, Fla.)" ;
    .

<http://experiment.worldcat.org/entity/work/data/353430160#Series/proceedings_electrochemical_society> # Proceedings (Electrochemical Society) ;
    a bgn:PublicationSeries ;
   schema:hasPart <http://www.worldcat.org/oclc/32389560> ; # Proceedings of the Symposium on Diagnostic Techniques for Semiconductor Materials and Devices
   schema:name "Proceedings (Electrochemical Society) ;" ;
   schema:name "Proceedings / Electrochemical Society ;" ;
    .

<http://experiment.worldcat.org/entity/work/data/353430160#Topic/halbleiterbauelement> # Halbleiterbauelement
    a schema:Intangible ;
   schema:name "Halbleiterbauelement"@en ;
    .

<http://experiment.worldcat.org/entity/work/data/353430160#Topic/semiconducteurs_essais> # Semiconducteurs--Essais
    a schema:Intangible ;
   schema:name "Semiconducteurs--Essais"@en ;
    .

<http://id.worldcat.org/fast/1112261> # Semiconductors--Testing
    a schema:Intangible ;
   schema:name "Semiconductors--Testing"@en ;
    .

<http://viaf.org/viaf/33653614> # Janet L. Benton
    a schema:Person ;
   schema:familyName "Benton" ;
   schema:givenName "Janet L." ;
   schema:givenName "J. L." ;
   schema:name "Janet L. Benton" ;
    .

<http://worldcat.org/isbn/9781566770927>
    a schema:ProductModel ;
   schema:isbn "1566770920" ;
   schema:isbn "9781566770927" ;
    .

<http://www.worldcat.org/title/-/oclc/32389560>
    a genont:InformationResource, genont:ContentTypeGenericResource ;
   schema:about <http://www.worldcat.org/oclc/32389560> ; # Proceedings of the Symposium on Diagnostic Techniques for Semiconductor Materials and Devices
   schema:dateModified "2017-09-04" ;
   void:inDataset <http://purl.oclc.org/dataset/WorldCat> ;
    .


Content-negotiable representations

Close Window

Please sign in to WorldCat 

Don't have an account? You can easily create a free account.