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Process and equipment control in microelectronic manufacturing II : 30-31 May 2001, Edinburgh, UK

Author: Martin Fallon, Dr.; Society of Photo-optical Instrumentation Engineers.; Scottish Enterprise.; European Optical Society.; Institution of Electrical Engineers.
Publisher: Bellingham, Wash. : Society of Photo-optical Instrumentation Engineers, ©2001.
Series: Proceedings of SPIE--the International Society for Optical Engineering, v. 4405.
Edition/Format:   Print book : Conference publication : EnglishView all editions and formats
Database:WorldCat
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Genre/Form: Conference papers and proceedings
Congresses
Material Type: Conference publication
Document Type: Book
All Authors / Contributors: Martin Fallon, Dr.; Society of Photo-optical Instrumentation Engineers.; Scottish Enterprise.; European Optical Society.; Institution of Electrical Engineers.
ISBN: 0819441066 9780819441065
OCLC Number: 47856798
Description: v, 158 pages : illustrations ; 28 cm.
Contents: SPC, modeling, and defectivity --
Control of process equipment and materials --
Photo and etch process control --
Poster session.
Series Title: Proceedings of SPIE--the International Society for Optical Engineering, v. 4405.
Responsibility: Martin Fallon, chair/editor ; sponsored and published by SPIE--the International Society for Optical Engineering ; cosponsored by Scottish Enterprise (UK) ; cooperating organizations EOS--European Optical Society, IEE--the Institution of Electrical Engineers (UK).

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