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A production-compatible microelectronic test pattern for evaluating photomask misalignment

Author: T J Russell; Dwight A Maxwell; United States. National Bureau of Standards.; United States. Advanced Research Projects Agency.
Publisher: Washington : U.S. Dept. of Commerce, National Bureau of Standards : For sale by the Supt. of Docs., U.S. Govt. Print. Off., 1979.
Series: Semiconductor measurement technology.; NBS special publication, 400-51.
Edition/Format:   Print book : EnglishView all editions and formats
Database:WorldCat
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Additional Physical Format: Online version:
Russell, T.J. (Thomas James), 1943-
Production-compatible microelectronic test pattern for evaluating photomask misalignment.
Washington : U.S. Dept. of Commerce, National Bureau of Standards : For sale by the Supt. of Docs., U.S. Govt. Print. Off., 1979
(OCoLC)633088701
Document Type: Book
All Authors / Contributors: T J Russell; Dwight A Maxwell; United States. National Bureau of Standards.; United States. Advanced Research Projects Agency.
OCLC Number: 4591321
Description: iii, 28 pages : illustrations ; 26 cm.
Series Title: Semiconductor measurement technology.; NBS special publication, 400-51.
Responsibility: T.J. Russell, D.A. Maxwell ; sponsored by the National Bureau of Standards and Advanced Research Projects Agency.

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