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A production-compatible microelectronic test pattern for evaluating photomask misalignment

Auteur : T J Russell; Dwight A Maxwell; United States. National Bureau of Standards.; United States. Advanced Research Projects Agency.
Éditeur : Washington : U.S. Dept. of Commerce, National Bureau of Standards : For sale by the Supt. of Docs., U.S. Govt. Print. Off., 1979.
Collection : Semiconductor measurement technology.; NBS special publication, 400-51.
Édition/format :   Livre imprimé : EnglishVoir toutes les éditions et tous les formats
Base de données :WorldCat
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Détails

Format – détails additionnels : Online version:
Russell, T.J. (Thomas James), 1943-
Production-compatible microelectronic test pattern for evaluating photomask misalignment.
Washington : U.S. Dept. of Commerce, National Bureau of Standards : For sale by the Supt. of Docs., U.S. Govt. Print. Off., 1979
(OCoLC)633088701
Format : Book
Tous les auteurs / collaborateurs : T J Russell; Dwight A Maxwell; United States. National Bureau of Standards.; United States. Advanced Research Projects Agency.
Numéro OCLC : 4591321
Description : iii, 28 pages : illustrations ; 26 cm.
Titre de collection : Semiconductor measurement technology.; NBS special publication, 400-51.
Responsabilité : T.J. Russell, D.A. Maxwell ; sponsored by the National Bureau of Standards and Advanced Research Projects Agency.

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Données liées


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