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A production-compatible microelectronic test pattern for evaluating photomask misalignment

Autore: T J Russell; Dwight A Maxwell; United States. National Bureau of Standards.; United States. Advanced Research Projects Agency.
Editore: Washington : U.S. Dept. of Commerce, National Bureau of Standards : For sale by the Supt. of Docs., U.S. Govt. Print. Off., 1979.
Serie: Semiconductor measurement technology.; NBS special publication, 400-51.
Edizione/Formato:   book_printbook : EnglishVedi tutte le edizioni e i formati
Banca dati:WorldCat
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Informazioni aggiuntive sul formato: Online version:
Russell, T.J. (Thomas James), 1943-
Production-compatible microelectronic test pattern for evaluating photomask misalignment.
Washington : U.S. Dept. of Commerce, National Bureau of Standards : For sale by the Supt. of Docs., U.S. Govt. Print. Off., 1979
(OCoLC)633088701
Tipo documento: Book
Tutti gli autori / Collaboratori: T J Russell; Dwight A Maxwell; United States. National Bureau of Standards.; United States. Advanced Research Projects Agency.
Numero OCLC: 4591321
Descrizione: iii, 28 pages : illustrations ; 26 cm.
Titolo della serie: Semiconductor measurement technology.; NBS special publication, 400-51.
Responsabilità: T.J. Russell, D.A. Maxwell ; sponsored by the National Bureau of Standards and Advanced Research Projects Agency.

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