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A production-compatible microelectronic test pattern for evaluating photomask misalignment

저자: T J Russell; Dwight A Maxwell; United States. National Bureau of Standards.; United States. Advanced Research Projects Agency.
출판사: Washington : U.S. Dept. of Commerce, National Bureau of Standards : For sale by the Supt. of Docs., U.S. Govt. Print. Off., 1979.
시리즈: Semiconductor measurement technology.; NBS special publication, 400-51.
판/형식:   Print book : 영어모든 판과 형식 보기
데이터베이스:WorldCat
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추가적인 물리적 형식: Online version:
Russell, T.J. (Thomas James), 1943-
Production-compatible microelectronic test pattern for evaluating photomask misalignment.
Washington : U.S. Dept. of Commerce, National Bureau of Standards : For sale by the Supt. of Docs., U.S. Govt. Print. Off., 1979
(OCoLC)633088701
문서 형식:
모든 저자 / 참여자: T J Russell; Dwight A Maxwell; United States. National Bureau of Standards.; United States. Advanced Research Projects Agency.
OCLC 번호: 4591321
설명: iii, 28 pages : illustrations ; 26 cm.
일련 제목: Semiconductor measurement technology.; NBS special publication, 400-51.
책임: T.J. Russell, D.A. Maxwell ; sponsored by the National Bureau of Standards and Advanced Research Projects Agency.

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Primary Entity

<http://www.worldcat.org/oclc/4591321> # A production-compatible microelectronic test pattern for evaluating photomask misalignment
    a schema:Book, schema:CreativeWork ;
   library:oclcnum "4591321" ;
   library:placeOfPublication <http://experiment.worldcat.org/entity/work/data/14918949#Place/washington> ; # Washington
   library:placeOfPublication <http://id.loc.gov/vocabulary/countries/dcu> ;
   schema:about <http://experiment.worldcat.org/entity/work/data/14918949#Topic/circuits_integres_masques_essais> ; # Circuits intégrés--Masques--Essais
   schema:about <http://id.worldcat.org/fast/975578> ; # Integrated circuits--Masks--Testing
   schema:about <http://dewey.info/class/602.1/> ;
   schema:about <http://experiment.worldcat.org/entity/work/data/14918949#Topic/integrated_circuits_masks_testing> ; # Integrated circuits--Masks--Testing
   schema:author <http://viaf.org/viaf/274533015> ; # Dwight A. Maxwell
   schema:bookFormat bgn:PrintBook ;
   schema:contributor <http://viaf.org/viaf/126653902> ; # United States. National Bureau of Standards.
   schema:contributor <http://experiment.worldcat.org/entity/work/data/14918949#Organization/united_states_advanced_research_projects_agency> ; # United States. Advanced Research Projects Agency.
   schema:creator <http://experiment.worldcat.org/entity/work/data/14918949#Person/russell_t_j_thomas_james_1943> ; # Thomas James Russell
   schema:datePublished "1979" ;
   schema:exampleOfWork <http://worldcat.org/entity/work/id/14918949> ;
   schema:inLanguage "en" ;
   schema:isPartOf <http://experiment.worldcat.org/entity/work/data/14918949#Series/semiconductor_measurement_technology> ; # Semiconductor measurement technology.
   schema:isPartOf <http://experiment.worldcat.org/entity/work/data/14918949#Series/nbs_special_publication> ; # NBS special publication ;
   schema:isSimilarTo <http://www.worldcat.org/oclc/633088701> ;
   schema:name "A production-compatible microelectronic test pattern for evaluating photomask misalignment"@en ;
   schema:productID "4591321" ;
   schema:publication <http://www.worldcat.org/title/-/oclc/4591321#PublicationEvent/washington_u_s_dept_of_commerce_national_bureau_of_standards_for_sale_by_the_supt_of_docs_u_s_govt_print_off_1979> ;
   schema:publisher <http://experiment.worldcat.org/entity/work/data/14918949#Agent/u_s_dept_of_commerce_national_bureau_of_standards> ; # U.S. Dept. of Commerce, National Bureau of Standards
   schema:publisher <http://experiment.worldcat.org/entity/work/data/14918949#Agent/for_sale_by_the_supt_of_docs_u_s_govt_print_off> ; # For sale by the Supt. of Docs., U.S. Govt. Print. Off.
   wdrs:describedby <http://www.worldcat.org/title/-/oclc/4591321> ;
    .


Related Entities

<http://experiment.worldcat.org/entity/work/data/14918949#Agent/for_sale_by_the_supt_of_docs_u_s_govt_print_off> # For sale by the Supt. of Docs., U.S. Govt. Print. Off.
    a bgn:Agent ;
   schema:name "For sale by the Supt. of Docs., U.S. Govt. Print. Off." ;
    .

<http://experiment.worldcat.org/entity/work/data/14918949#Agent/u_s_dept_of_commerce_national_bureau_of_standards> # U.S. Dept. of Commerce, National Bureau of Standards
    a bgn:Agent ;
   schema:name "U.S. Dept. of Commerce, National Bureau of Standards" ;
    .

<http://experiment.worldcat.org/entity/work/data/14918949#Organization/united_states_advanced_research_projects_agency> # United States. Advanced Research Projects Agency.
    a schema:Organization ;
   schema:name "United States. Advanced Research Projects Agency." ;
    .

<http://experiment.worldcat.org/entity/work/data/14918949#Person/russell_t_j_thomas_james_1943> # Thomas James Russell
    a schema:Person ;
   schema:birthDate "1943" ;
   schema:familyName "Russell" ;
   schema:givenName "Thomas James" ;
   schema:givenName "T. J." ;
   schema:name "Thomas James Russell" ;
    .

<http://experiment.worldcat.org/entity/work/data/14918949#Series/nbs_special_publication> # NBS special publication ;
    a bgn:PublicationSeries ;
   schema:hasPart <http://www.worldcat.org/oclc/4591321> ; # A production-compatible microelectronic test pattern for evaluating photomask misalignment
   schema:name "NBS special publication ;" ;
    .

<http://experiment.worldcat.org/entity/work/data/14918949#Series/semiconductor_measurement_technology> # Semiconductor measurement technology.
    a bgn:PublicationSeries ;
   schema:hasPart <http://www.worldcat.org/oclc/4591321> ; # A production-compatible microelectronic test pattern for evaluating photomask misalignment
   schema:name "Semiconductor measurement technology." ;
   schema:name "Semiconductor measurement technology" ;
    .

<http://experiment.worldcat.org/entity/work/data/14918949#Topic/circuits_integres_masques_essais> # Circuits intégrés--Masques--Essais
    a schema:Intangible ;
   schema:name "Circuits intégrés--Masques--Essais"@en ;
    .

<http://id.worldcat.org/fast/975578> # Integrated circuits--Masks--Testing
    a schema:Intangible ;
   schema:name "Integrated circuits--Masks--Testing"@en ;
    .

<http://viaf.org/viaf/126653902> # United States. National Bureau of Standards.
    a schema:Organization ;
   schema:name "United States. National Bureau of Standards." ;
    .

<http://viaf.org/viaf/274533015> # Dwight A. Maxwell
    a schema:Person ;
   schema:familyName "Maxwell" ;
   schema:givenName "Dwight A." ;
   schema:name "Dwight A. Maxwell" ;
    .

<http://www.worldcat.org/oclc/633088701>
    a schema:CreativeWork ;
   rdfs:label "Production-compatible microelectronic test pattern for evaluating photomask misalignment." ;
   schema:description "Online version:" ;
   schema:isSimilarTo <http://www.worldcat.org/oclc/4591321> ; # A production-compatible microelectronic test pattern for evaluating photomask misalignment
    .

<http://www.worldcat.org/title/-/oclc/4591321>
    a genont:InformationResource, genont:ContentTypeGenericResource ;
   schema:about <http://www.worldcat.org/oclc/4591321> ; # A production-compatible microelectronic test pattern for evaluating photomask misalignment
   schema:dateModified "2016-05-12" ;
   void:inDataset <http://purl.oclc.org/dataset/WorldCat> ;
    .


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