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A production-compatible microelectronic test pattern for evaluating photomask misalignment

著者: T J Russell; Dwight A Maxwell; United States. National Bureau of Standards.; United States. Advanced Research Projects Agency.
出版商: Washington : U.S. Dept. of Commerce, National Bureau of Standards : For sale by the Supt. of Docs., U.S. Govt. Print. Off., 1979.
丛书: Semiconductor measurement technology.; NBS special publication, 400-51.
版本/格式:   图书 : 英语
数据库:WorldCat
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Russell, T. J. (Thomas James), 1943-
Production-compatible microelectronic test pattern for evaluating photomask misalignment.
Washington : U.S. Dept. of Commerce, National Bureau of Standards : For sale by the Supt. of Docs., U.S. Govt. Print. Off., 1979
(OCoLC)633088701
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所有的著者/提供者: T J Russell; Dwight A Maxwell; United States. National Bureau of Standards.; United States. Advanced Research Projects Agency.
OCLC号码: 4591321
描述: iii, 28 p. : ill. ; 26 cm.
丛书名: Semiconductor measurement technology.; NBS special publication, 400-51.
责任: T.J. Russell, D.A. Maxwell ; sponsored by the National Bureau of Standards and Advanced Research Projects Agency.

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