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A production-compatible microelectronic test pattern for evaluating photomask misalignment

作者: T J Russell; Dwight A Maxwell; United States. National Bureau of Standards.; United States. Advanced Research Projects Agency.
出版商: Washington : U.S. Dept. of Commerce, National Bureau of Standards : For sale by the Supt. of Docs., U.S. Govt. Print. Off., 1979.
叢書: Semiconductor measurement technology.; NBS special publication, 400-51.
版本/格式:   圖書 : 英語所有版本和格式的總覽
資料庫:WorldCat
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Russell, T. J. (Thomas James), 1943-
Production-compatible microelectronic test pattern for evaluating photomask misalignment.
Washington : U.S. Dept. of Commerce, National Bureau of Standards : For sale by the Supt. of Docs., U.S. Govt. Print. Off., 1979
(OCoLC)633088701
文件類型: 圖書
所有的作者/貢獻者: T J Russell; Dwight A Maxwell; United States. National Bureau of Standards.; United States. Advanced Research Projects Agency.
OCLC系統控制編碼: 4591321
描述: iii, 28 p. : ill. ; 26 cm.
叢書名: Semiconductor measurement technology.; NBS special publication, 400-51.
責任: T.J. Russell, D.A. Maxwell ; sponsored by the National Bureau of Standards and Advanced Research Projects Agency.

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