skip to content
A production-compatible microelectronic test pattern for evaluating photomask misalignment Preview this item
ClosePreview this item
Checking...

A production-compatible microelectronic test pattern for evaluating photomask misalignment

Author: T J Russell; Dwight A Maxwell; United States. National Bureau of Standards.; United States. Advanced Research Projects Agency.
Publisher: Washington : U.S. Dept. of Commerce, National Bureau of Standards : For sale by the Supt. of Docs., U.S. Govt. Print. Off., 1979.
Series: Semiconductor measurement technology.; NBS special publication, 400-51.
Edition/Format:   Book : EnglishView all editions and formats
Database:WorldCat
Rating:

(not yet rated) 0 with reviews - Be the first.

Subjects
More like this

 

Find a copy in the library

&AllPage.SpinnerRetrieving; Finding libraries that hold this item...

Details

Additional Physical Format: Online version:
Russell, T.J. (Thomas James), 1943-
Production-compatible microelectronic test pattern for evaluating photomask misalignment.
Washington : U.S. Dept. of Commerce, National Bureau of Standards : For sale by the Supt. of Docs., U.S. Govt. Print. Off., 1979
(OCoLC)633088701
Document Type: Book
All Authors / Contributors: T J Russell; Dwight A Maxwell; United States. National Bureau of Standards.; United States. Advanced Research Projects Agency.
OCLC Number: 4591321
Description: iii, 28 pages : illustrations ; 26 cm.
Series Title: Semiconductor measurement technology.; NBS special publication, 400-51.
Responsibility: T.J. Russell, D.A. Maxwell ; sponsored by the National Bureau of Standards and Advanced Research Projects Agency.

Reviews

User-contributed reviews
Retrieving GoodReads reviews...
Retrieving DOGObooks reviews...

Tags

Be the first.
Confirm this request

You may have already requested this item. Please select Ok if you would like to proceed with this request anyway.

Linked Data


<http://www.worldcat.org/oclc/4591321>
library:oclcnum"4591321"
library:placeOfPublication
library:placeOfPublication
owl:sameAs<info:oclcnum/4591321>
rdf:typeschema:Book
schema:about
schema:about
schema:about
schema:about
schema:about
schema:contributor
<http://viaf.org/viaf/145989280>
rdf:typeschema:Organization
schema:name"United States. National Bureau of Standards."
schema:contributor
schema:contributor
<http://viaf.org/viaf/154230733>
rdf:typeschema:Organization
schema:name"United States. Advanced Research Projects Agency."
schema:creator
schema:datePublished"1979"
schema:exampleOfWork<http://worldcat.org/entity/work/id/1953683205>
schema:inLanguage"en"
schema:name"A production-compatible microelectronic test pattern for evaluating photomask misalignment"@en
schema:publisher
schema:publisher
schema:url

Content-negotiable representations

Close Window

Please sign in to WorldCat 

Don't have an account? You can easily create a free account.