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Results of the Monte Carlo calculation of one- and two-dimensional distributions of particles and damage : ion implanted dopants in silicon

Author: John Albers; United States. Defense Advanced Research Projects Agency.; United States. National Bureau of Standards.
Publisher: Gaithersburg, MD : U.S. Dept. of Commerce, National Bureau of Standards, 1987.
Series: NBS special publication, 400-79.; Semiconductor measurement technology.
Edition/Format:   Book : National government publication : EnglishView all editions and formats
Database:WorldCat
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Material Type: Government publication, National government publication
Document Type: Book
All Authors / Contributors: John Albers; United States. Defense Advanced Research Projects Agency.; United States. National Bureau of Standards.
OCLC Number: 18906976
Notes: Distributed to depository libraries in microfiche.
No longer available for sale by the Supt. of Docs.
"September 1987."
Description: iv, 667 p. : ill. ; 28 cm.
Series Title: NBS special publication, 400-79.; Semiconductor measurement technology.
Responsibility: John Albers.

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