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Review of fundamental processes and applications of atoms and ions

Author: C D Lin
Publisher: Singapore ; River Edge, NJ : World Scientific, ©1993.
Edition/Format:   eBook : Document : EnglishView all editions and formats
Database:WorldCat
Summary:

This collection of papers presents a review of this field, discussing topics including: atomic processes in thermonuclear fusion plasmas; progress in atomic collisions with multiple charged ions; and  Read more...

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Genre/Form: Electronic books
Additional Physical Format: Print version:
Lin, C.D. (Chii-Dong), 1946-
Review of fundamental processes and applications of atoms and ions.
Singapore ; River Edge, NJ : World Scientific, ©1993
(DLC) 94165730
(OCoLC)30323353
Material Type: Document, Internet resource
Document Type: Internet Resource, Computer File
All Authors / Contributors: C D Lin
ISBN: 9789814354288 9814354287
OCLC Number: 841809859
Description: 1 online resource (xii, 614 pages) : illustrations
Responsibility: C.D. Lin.

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