skip to content
Self-diffusion of beryllium in unirradiated, cold-pressed and sintered beryllium oxide Preview this item
ClosePreview this item
Checking...

Self-diffusion of beryllium in unirradiated, cold-pressed and sintered beryllium oxide

Author: H J De Bruin; G M Watson; Oak Ridge National Laboratory. Reactor Chemistry Division.; Union Carbide Corporation.; U.S. Atomic Energy Commission.
Publisher: Oak Ridge, Tenn. : Oak Ridge National Laboratory, 1964.
Series: ORNL, 3526.
Edition/Format:   eBook : Document : National government publication : EnglishView all editions and formats
Summary:
Diffusion of beryllium-7 through polycrystalline unirradiated specimens of BeO was studied as a preliminary step to a study of diffusion in irradiated material. Beryllium-7 was deposited on one end of cylindrical specimens by exchange and adsorption from aqueous solution. The depth of penetration perpendicular to the surfaces of deposition was determined after annealing the specimens at pre-determined conditions. A  Read more...
Rating:

(not yet rated) 0 with reviews - Be the first.

Subjects
More like this

Find a copy online

Find a copy in the library

&AllPage.SpinnerRetrieving; Finding libraries that hold this item...

Details

Additional Physical Format: Print version:
De Bruin, H.J.
Self-diffusion of beryllium in unirradiated, cold-pressed and sintered beryllium oxide.
Oak Ridge, Tenn. : Oak Ridge National Laboratory, 1964
(OCoLC)460783608
Material Type: Document, Government publication, National government publication, Internet resource
Document Type: Internet Resource, Computer File
All Authors / Contributors: H J De Bruin; G M Watson; Oak Ridge National Laboratory. Reactor Chemistry Division.; Union Carbide Corporation.; U.S. Atomic Energy Commission.
OCLC Number: 682000319
Reproduction Notes: Electronic reproduction. [S.l.] : HathiTrust Digital Library, 2010. MiAaHDL
Description: 1 online resource (37 pages) : illustrations.
Details: Master and use copy. Digital master created according to Benchmark for Faithful Digital Reproductions of Monographs and Serials, Version 1. Digital Library Federation, December 2002.
Series Title: ORNL, 3526.
Responsibility: H.J. de Bruin, G.M. Watson.

Abstract:

Diffusion of beryllium-7 through polycrystalline unirradiated specimens of BeO was studied as a preliminary step to a study of diffusion in irradiated material. Beryllium-7 was deposited on one end of cylindrical specimens by exchange and adsorption from aqueous solution. The depth of penetration perpendicular to the surfaces of deposition was determined after annealing the specimens at pre-determined conditions. A simple lapping device of high precision was developed to determine penetration depths. For the polycrystalline cold-pressed and sintered BeO studied, the diffusion behavior between 1150 and 1800 deg C is described by the empirical relation: D = 2.49 x 10/sup -3/ exp -- (62.5 x 10/sup 3//RT) cm/sup 2//sec. A diffusion model is proposed based on vacancy migration which suggests identical activation energies for diffusion in both a and c directions in single crystals and predicts an activation energy of the correct order oi magnitude. Furthermore, the model p dicts that the frequency factor in the direction pexpendicular to the c axis should be about 50% higher than that parallel to the c axis. (auth).

Reviews

User-contributed reviews
Retrieving GoodReads reviews...
Retrieving DOGObooks reviews...

Tags

Be the first.

Similar Items

Related Subjects:(3)

Confirm this request

You may have already requested this item. Please select Ok if you would like to proceed with this request anyway.

Linked Data


Primary Entity

<http://www.worldcat.org/oclc/682000319> # Self-diffusion of beryllium in unirradiated, cold-pressed and sintered beryllium oxide
    a schema:MediaObject, schema:CreativeWork, schema:Book ;
   library:oclcnum "682000319" ;
   library:placeOfPublication <http://experiment.worldcat.org/entity/work/data/345063731#Place/oak_ridge_tenn> ; # Oak Ridge, Tenn.
   library:placeOfPublication <http://id.loc.gov/vocabulary/countries/tnu> ;
   schema:about <http://id.worldcat.org/fast/830825> ; # Beryllium
   schema:about <http://id.worldcat.org/fast/893534> ; # Diffusion
   schema:about <http://id.worldcat.org/fast/830843> ; # Beryllium oxide
   schema:bookFormat schema:EBook ;
   schema:contributor <http://viaf.org/viaf/138898115> ; # U.S. Atomic Energy Commission.
   schema:contributor <http://viaf.org/viaf/149970335> ; # Oak Ridge National Laboratory. Reactor Chemistry Division.
   schema:contributor <http://viaf.org/viaf/91344209> ; # G. M. Watson
   schema:contributor <http://viaf.org/viaf/128939882> ; # Union Carbide Corporation.
   schema:creator <http://experiment.worldcat.org/entity/work/data/345063731#Person/de_bruin_h_j> ; # H. J. De Bruin
   schema:datePublished "1964" ;
   schema:description "Diffusion of beryllium-7 through polycrystalline unirradiated specimens of BeO was studied as a preliminary step to a study of diffusion in irradiated material. Beryllium-7 was deposited on one end of cylindrical specimens by exchange and adsorption from aqueous solution. The depth of penetration perpendicular to the surfaces of deposition was determined after annealing the specimens at pre-determined conditions. A simple lapping device of high precision was developed to determine penetration depths. For the polycrystalline cold-pressed and sintered BeO studied, the diffusion behavior between 1150 and 1800 deg C is described by the empirical relation: D = 2.49 x 10/sup -3/ exp -- (62.5 x 10/sup 3//RT) cm/sup 2//sec. A diffusion model is proposed based on vacancy migration which suggests identical activation energies for diffusion in both a and c directions in single crystals and predicts an activation energy of the correct order oi magnitude. Furthermore, the model p dicts that the frequency factor in the direction pexpendicular to the c axis should be about 50% higher than that parallel to the c axis. (auth)."@en ;
   schema:exampleOfWork <http://worldcat.org/entity/work/id/345063731> ;
   schema:genre "Government publication"@en ;
   schema:genre "National government publication"@en ;
   schema:inLanguage "en" ;
   schema:isPartOf <http://experiment.worldcat.org/entity/work/data/345063731#Series/ornl> ; # ORNL ;
   schema:isSimilarTo <http://www.worldcat.org/oclc/460783608> ;
   schema:name "Self-diffusion of beryllium in unirradiated, cold-pressed and sintered beryllium oxide"@en ;
   schema:productID "682000319" ;
   schema:publication <http://www.worldcat.org/title/-/oclc/682000319#PublicationEvent/oak_ridge_tenn_oak_ridge_national_laboratory_1964> ;
   schema:publisher <http://experiment.worldcat.org/entity/work/data/345063731#Agent/oak_ridge_national_laboratory> ; # Oak Ridge National Laboratory
   schema:url <http://books.google.com/books?id=psg9Uwt_QuwC> ;
   schema:url <http://catalog.hathitrust.org/api/volumes/oclc/460783608.html> ;
   wdrs:describedby <http://www.worldcat.org/title/-/oclc/682000319> ;
    .


Related Entities

<http://experiment.worldcat.org/entity/work/data/345063731#Agent/oak_ridge_national_laboratory> # Oak Ridge National Laboratory
    a bgn:Agent ;
   schema:name "Oak Ridge National Laboratory" ;
    .

<http://experiment.worldcat.org/entity/work/data/345063731#Person/de_bruin_h_j> # H. J. De Bruin
    a schema:Person ;
   schema:familyName "De Bruin" ;
   schema:givenName "H. J." ;
   schema:name "H. J. De Bruin" ;
    .

<http://experiment.worldcat.org/entity/work/data/345063731#Place/oak_ridge_tenn> # Oak Ridge, Tenn.
    a schema:Place ;
   schema:name "Oak Ridge, Tenn." ;
    .

<http://experiment.worldcat.org/entity/work/data/345063731#Series/ornl> # ORNL ;
    a bgn:PublicationSeries ;
   schema:hasPart <http://www.worldcat.org/oclc/682000319> ; # Self-diffusion of beryllium in unirradiated, cold-pressed and sintered beryllium oxide
   schema:name "ORNL ;" ;
    .

<http://id.worldcat.org/fast/830825> # Beryllium
    a schema:Intangible ;
   schema:name "Beryllium"@en ;
    .

<http://id.worldcat.org/fast/830843> # Beryllium oxide
    a schema:Intangible ;
   schema:name "Beryllium oxide"@en ;
    .

<http://id.worldcat.org/fast/893534> # Diffusion
    a schema:Intangible ;
   schema:name "Diffusion"@en ;
    .

<http://viaf.org/viaf/128939882> # Union Carbide Corporation.
    a schema:Organization ;
   schema:name "Union Carbide Corporation." ;
    .

<http://viaf.org/viaf/138898115> # U.S. Atomic Energy Commission.
    a schema:Organization ;
   schema:name "U.S. Atomic Energy Commission." ;
    .

<http://viaf.org/viaf/149970335> # Oak Ridge National Laboratory. Reactor Chemistry Division.
    a schema:Organization ;
   schema:name "Oak Ridge National Laboratory. Reactor Chemistry Division." ;
    .

<http://viaf.org/viaf/91344209> # G. M. Watson
    a schema:Person ;
   schema:familyName "Watson" ;
   schema:givenName "G. M." ;
   schema:name "G. M. Watson" ;
    .

<http://www.worldcat.org/oclc/460783608>
    a schema:CreativeWork ;
   rdfs:label "Self-diffusion of beryllium in unirradiated, cold-pressed and sintered beryllium oxide." ;
   schema:description "Print version:" ;
   schema:isSimilarTo <http://www.worldcat.org/oclc/682000319> ; # Self-diffusion of beryllium in unirradiated, cold-pressed and sintered beryllium oxide
    .

<http://www.worldcat.org/title/-/oclc/682000319>
    a genont:InformationResource, genont:ContentTypeGenericResource ;
   schema:about <http://www.worldcat.org/oclc/682000319> ; # Self-diffusion of beryllium in unirradiated, cold-pressed and sintered beryllium oxide
   schema:dateModified "2018-03-09" ;
   void:inDataset <http://purl.oclc.org/dataset/WorldCat> ;
    .


Content-negotiable representations

Close Window

Please sign in to WorldCat 

Don't have an account? You can easily create a free account.