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Some aspects of dose measurement for accurate ion implantation

Author: Douglas M Jamba; United States. National Bureau of Standards.
Publisher: Washington : U.S. Dept. of Commerce, National Bureau of Standards : For sale by the Supt. of Docs., U.S. Govt. Print. Off., 1977.
Series: Semiconductor measurement technology.; NBS special publication, 400-39.
Edition/Format:   Print book : EnglishView all editions and formats
Database:WorldCat
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Additional Physical Format: Online version:
Jamba, Douglas M.
Some aspects of dose measurement for accurate ion implantation.
Washington : U.S. Dept. of Commerce, National Bureau of Standards : For sale by the Supt. of Docs., U.S. Govt. Print. Off., 1977
(OCoLC)631209640
Document Type: Book
All Authors / Contributors: Douglas M Jamba; United States. National Bureau of Standards.
OCLC Number: 3186356
Description: vii, 36 pages : illustrations ; 26 cm.
Series Title: Semiconductor measurement technology.; NBS special publication, 400-39.
Responsibility: Douglas M. Jamba.

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