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| 材料类型： | 互联网资源 |
|---|---|
| 文件类型： | 书, 互联网资源 |
| 所有的著者/提供者： |
Hiroyuki Fujiwara |
| ISBN: | 9780470016084 0470016086 |
| OCLC号码： | 71507562 |
| 描述： | xviii, 369 p. : ill. ; 24 cm. |
| 内容： | 1.1 Features of Spectroscopic Ellipsometry 1 -- 1.2 Applications of Spectroscopic Ellipsometry 3 -- 1.3 Data Analysis 5 -- 1.4 History of Development 7 -- 1.5 Future Prospects 9 -- 2 Principles of Optics 13 -- 2.1 Propagation of Light 13 -- 2.1.1 Propagation of One-Dimensional Waves 13 -- 2.1.2 Electromagnetic Waves 18 -- 2.1.3 Refractive Index 19 -- 2.2 Dielectrics 24 -- 2.2.1 Dielectric Polarization 24 -- 2.2.2 Dielectric Constant 25 -- 2.2.3 Dielectric Function 29 -- 2.3 Reflection and Transmission of Light 32 -- 2.3.1 Refraction of Light 32 -- 2.3.2 p- and s-Polarized Light Waves 33 -- 2.3.3 Reflectance and Transmittance 39 -- 2.3.4 Brewster Angle 40 -- 2.3.5 Total Reflection 42 -- 2.4 Optical Interference 43 -- 2.4.1 Optical Interference in Thin Films 43 -- 2.4.2 Multilayers 46 -- 3 Polarization of Light 49 -- 3.1 Representation of Polarized Light 49 -- 3.1.1 Phase of Light 49 -- 3.1.2 Polarization States of Light Waves 50 -- 3.2 Optical Elements 52 -- 3.2.1 Polarizer (Analyzer) 53 -- 3.2.2 Compensator (Retarder) 57 -- 3.2.3 Photoelastic Modulator 58 -- 3.2.4 Depolarizer 59 -- 3.3 Jones Matrix 60 -- 3.3.1 Jones Vector 60 -- 3.3.2 Transformation of Coordinate Systems 62 -- 3.3.3 Jones Matrices of Optical Elements 66 -- 3.3.4 Representation of Optical Measurement / Jones Matrices 68 -- 3.4 Stokes Parameters 70 -- 3.4.1 Definition of Stokes Parameters 70 -- 3.4.2 Poincare Sphere 72 -- 3.4.3 Partially Polarized Light 75 -- 3.4.4 Mueller Matrix 77 -- 4 Principles of Spectroscopic Ellipsometry 81 -- 4.1 Principles of Ellipsometry Measurement 81 -- 4.1.1 Measured Values in Ellipsometry 81 -- 4.1.2 Coordinate System in Ellipsometry 84 -- 4.1.3 Jones and Mueller Matrices of Samples 86 -- 4.2 Ellipsometry Measurement 87 -- 4.2.1 Measurement Methods of Ellipsometry 87 -- 4.2.2 Rotating-Analyzer Ellipsometry (RAE) 93 -- 4.2.3 Rotating-Analyzer Ellipsometry with Compensator 97 -- 4.2.4 Rotating-Compensator Ellipsometry (RCE) 99 -- 4.2.5 Phase-Modulation Ellipsometry (PME) 104 -- 4.2.6 Infrared Spectroscopic Ellipsometry 106 -- 4.2.7 Mueller Matrix Ellipsometry 111 -- 4.2.8 Null Ellipsometry and Imaging Ellipsometry 113 -- 4.3 Instrumentation for Ellipsometry 117 -- 4.3.1 Installation of Ellipsometry System 117 -- 4.3.2 Fourier Analysis 120 -- 4.3.3 Calibration of Optical Elements 122 -- 4.3.4 Correction of Measurement Errors 127 -- 4.4 Precision and Error of Measurement 130 -- 4.4.1 Variation of Precision and Error with Measurement Method 131 -- 4.4.2 Precision of ([psi], [Delta]) 135 -- 4.4.3 Precision of Film Thickness and Absorption Coefficient 137 -- 4.4.4 Depolarization Effect of Samples 139 -- 5 Data Analysis 147 -- 5.1 Interpretation of ([psi], [Delta]) 147 -- 5.1.1 Variations of ([psi], [Delta]) with Optical Constants 147 -- 5.1.2 Variations of ([psi], [Delta]) in Transparent Films 150 -- 5.1.3 Variations of ([psi], [Delta]) in Absorbing Films 155 -- 5.2 Dielectric Function Models 158 -- 5.2.1 Lorentz Model 160 -- 5.2.2 Interpretation of the Lorentz Model 162 -- 5.2.3 Sellmeier and Cauchy Models 170 -- 5.2.4 Tauc-Lorentz Model 170 -- 5.2.5 Drude Model 173 -- 5.2.6 Kramers-Kronig Relations 176 -- 5.3 Effective Medium Approximation 177 -- 5.3.1 Effective Medium Theories 177 -- 5.3.2 Modeling of Surface Roughness 181 -- 5.3.3 Limitations of Effective Medium Theories 184 -- 5.4 Optical Models 187 -- 5.4.1 Construction of Optical Models 187 -- 5.4.2 Pseudo-Dielectric Function 189 -- 5.4.3 Optimization of Sample Structures 191 -- 5.4.4 Optical Models for Depolarizing Samples 191 -- 5.5 Data Analysis Procedure 196 -- 5.5.1 Linear Regression Analysis 196 -- 5.5.2 Fitting Error Function 199 -- 5.5.3 Mathematical Inversion 200 -- 6 Ellipsometry of Anisotropic Materials 209 -- 6.1 Reflection and Transmission of Light by Anisotropic Materials 209 -- 6.1.1 Light Propagation in Anisotropic Media 209 -- 6.1.2 Index Ellipsoid 213 -- 6.1.3 Dielectric Tensor 215 -- 6.1.4 Jones Matrix of Anisotropic Samples 217 -- 6.2 Fresnel Equations for Anisotropic Materials 222 -- 6.2.1 Anisotropic Substrate 222 -- 6.2.2 Anisotropic Thin Film on Isotropic Substrate 224 -- 6.3 4 x 4 Matrix Method 226 -- 6.3.1 Principles of the 4 x 4 Matrix Method 226 -- 6.3.2 Calculation Method of Partial Transfer Matrix 232 -- 6.3.3 Calculation Methods of Incident and Exit Matrices 233 -- 6.3.4 Calculation Procedure of the 4 x 4 Matrix Method 236 -- 6.4 Interpretation of ([psi], [Delta]) for Anisotropic Materials 237 -- 6.4.1 Variations of ([psi], [Delta]) in Anisotropic Substrates 237 -- 6.4.2 Variations of ([psi], [Delta]) in Anisotropic Thin Films 241 -- 6.5 Measurement and Data Analysis of Anisotropic Materials 243 -- 6.5.1 Measurement Methods 243 -- 6.5.2 Data Analysis Methods 245 -- 7 Data Analysis Examples 249 -- 7.1 Insulators 249 -- 7.1.1 Analysis Examples 249 -- 7.1.2 Advanced Analysis 252 -- 7.2 Semiconductors 256 -- 7.2.1 Optical Transitions in Semiconductors 256 -- 7.2.2 Modeling of Dielectric Functions 258 -- 7.2.3 Analysis Examples 262 -- 7.2.4 Analysis of Dielectric Functions 268 -- 7.3 Metals/Semiconductors 276 -- 7.3.1 Dielectric Function of Metals 276 -- 7.3.2 Analysis of Free-Carrier Absorption 281 -- 7.3.3 Advanced Analysis 286 -- 7.4 Organic Materials/Biomaterials 287 -- 7.4.1 Analysis of Organic Materials 287 -- 7.4.2 Analysis of Biomaterials 292 -- 7.5 Anisotropic Materials 294 -- 7.5.1 Analysis of Anisotropic Insulators 295 -- 7.5.2 Analysis of Anisotropic Semiconductors 296 -- 7.5.3 Analysis of Anisotropic Organic Materials 299 -- 8 Real-Time Monitoring by Spectroscopic Ellipsometry 311 -- 8.1 Data Analysis in Real-Time Monitoring 311 -- 8.1.1 Procedures for Real-Time Data Analysis 312 -- 8.1.2 Linear Regression Analysis (LRA) 313 -- 8.1.3 Global Error Minimization (GEM) 317 -- 8.1.4 Virtual Substrate Approximation (VSA) 323 -- 8.2 Observation of Thin-Film Growth by Real-Time Monitoring 328 -- 8.2.1 Analysis Examples 328 -- 8.2.2 Advanced Analysis 331 -- 8.3 Process Control by Real-Time Monitoring 333 -- 8.3.1 Data Analysis in Process Control 334 -- 8.3.2 Process Control by Linear Regression Analysis (LRA) 334 -- 8.3.3 Process Control by Virtual Substrate Approximation (VSA) 340 -- 1 Trigonometric Functions 345 -- 2 Definitions of Optical Constants 347 -- 3 Maxwell's Equations for Conductors 349 -- 4 Jones-Mueller Matrix Conversion 353 -- 5 Kramers-Kronig Relations 357. |
| 责任： | Hiroyuki Fujiwara. |
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