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Validity limits in J-resistance curve determination

Author: C F Shih; Brown University. Division of Engineering.; Harvard University. Division of Applied Sciences.; U.S. Nuclear Regulatory Commission. Office of Nuclear Regulatory Research. Division of Engineering Technology.; et al
Publisher: Washington, DC : U.S. Nuclear Regulatory Commission, 1995.
Edition/Format:   Book   Microform : National government publication : Microfiche : EnglishView all editions and formats
Database:WorldCat
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Material Type: Government publication, National government publication
Document Type: Book
All Authors / Contributors: C F Shih; Brown University. Division of Engineering.; Harvard University. Division of Applied Sciences.; U.S. Nuclear Regulatory Commission. Office of Nuclear Regulatory Research. Division of Engineering Technology.; et al
OCLC Number: 34660333
Notes: "Division of Engineering, Brown University."
"Division of Applied Sciences, Harvard University"--V. 2.
"Date published: February 1995."
Reproduction Notes: Microfiche. [Washington, D.C.] : U.S. G.P.O., [1995]. 2 microfiches.
Description: 2 v. : ill. ; 28 cm.
Contents: v. 1. An assessment of the JM parameter --
v. 2. A computational approach to ductile crack growth under large-scale yielding conditions.
Responsibility: prepared by C.F. Shih ... [et al.] ; prepared for Division of Engineering Technology, Office of Nuclear Regulatory Research, U.S. Nuclear Regulatory Commission.

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