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Fundamentals of semiconductor fabrication

Author: Gary S May; S M Sze
Publisher: New York : Wiley, ©2004.
Edition/Format:   Print book : EnglishView all editions and formats
Summary:
"This concise introduction to semiconductor fabrication technology covers everything professionals need to know, from crystal growth to integrated devices and circuits. Throughout, the authors address both theory and the practical aspects of each major fabrication step, including crystal growth, silicon oxidation, photolithography, etching, diffusion, ion implantation, and thin film deposition."--Jacket.
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Material Type: Internet resource
Document Type: Book, Internet Resource
All Authors / Contributors: Gary S May; S M Sze
ISBN: 0471232793 9780471232797 0471452386 9780471452386
OCLC Number: 52333554
Description: xiii, 305 pages : illustrations ; 26 cm
Contents: 1. Introduction --
2. Crystal growth --
3. Silicon oxidation --
4. Photolithography --
5. Etching --
6. Diffusion --
7. Ion implantation --
8. Film deposition --
9. Process integration --
10. IC manufacturing --
11. Future trends and challenges --
Appendixes: --
A. List of symbols --
B. International system of units (SI units) --
C. Unit prefixes --
D. Greek alphabet --
E. Physical constants --
F. Properties of Si and GaAs at 300K --
G. Some properties of the error function --
H. Basic kinetic theory of gases --
I. SUPREM commands --
J. Running PROLITH --
K. Percentage points of the t distribution --
L. Percentage points of the F distribution.
Responsibility: Gary S. May, Simon M. Sze.
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Abstract:

From crystal growth to integrated devices and circuits, this new book offers a basic, up-to-date introduction to semiconductor fabrication technology, including both the theoretical and practical  Read more...

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