skip to content
Handbook of thin film process technology : 98/1 reactive sputtering Preview this item
ClosePreview this item
Checking...

Handbook of thin film process technology : 98/1 reactive sputtering

Author: David A Glocker; S Ismat Shah; William D Westwood
Publisher: Boca Raton, FL : CRC Press, 2018.
Series: CRC revivals.
Edition/Format:   eBook : Document : EnglishView all editions and formats
Rating:

(not yet rated) 0 with reviews - Be the first.

Subjects
More like this

Find a copy online

Links to this item

Find a copy in the library

&AllPage.SpinnerRetrieving; Finding libraries that hold this item...

Details

Genre/Form: Handbooks and manuals
Electronic books
Handbooks, manuals, etc
Additional Physical Format: Print version:
Glocker, David A.
Handbook of Thin Film Process Technology : 98/1 Reactive Sputtering.
Milton : CRC Press, ©2018
Material Type: Document, Internet resource
Document Type: Internet Resource, Computer File
All Authors / Contributors: David A Glocker; S Ismat Shah; William D Westwood
ISBN: 9781351081238 1351081233 9781351072786 1351072781
OCLC Number: 1020688572
Description: 1 online resource : illustrations.
Contents: Cover; Title Page; Copyright Page; Contents; A5: Reactive Sputtering Coordinating; A5.0 Reactive Sputtering: Introduction and General Discussion; A5.1 Reactive pulsed DC magnetron sputtering and control; A5.2 AC and RF reactive sputtering; A5.3 Modeling of the reactive sputtering process; Appendix A: List of Contributors; Index.
Series Title: CRC revivals.
Other Titles: 98/1 reactive sputtering
Thin film process technology
Responsibility: editors, David A. Glocker, S. Ismat Shah ; guest editor, William D. Westwood.

Reviews

User-contributed reviews
Retrieving GoodReads reviews...
Retrieving DOGObooks reviews...

Tags

Be the first.
Confirm this request

You may have already requested this item. Please select Ok if you would like to proceed with this request anyway.

Linked Data


Primary Entity

<http://www.worldcat.org/oclc/1020688572> # Handbook of thin film process technology : 98/1 reactive sputtering
    a schema:MediaObject, schema:Book, schema:CreativeWork ;
    library:oclcnum "1020688572" ;
    library:placeOfPublication <http://id.loc.gov/vocabulary/countries/flu> ;
    library:placeOfPublication <http://experiment.worldcat.org/entity/work/data/350504097#Place/boca_raton_fl> ; # Boca Raton, FL
    schema:about <http://experiment.worldcat.org/entity/work/data/350504097#Topic/surfaces_technology> ; # Surfaces (Technology)
    schema:about <http://dewey.info/class/530.4175/e23/> ;
    schema:about <http://experiment.worldcat.org/entity/work/data/350504097#Topic/science_energy> ; # SCIENCE--Energy
    schema:about <http://experiment.worldcat.org/entity/work/data/350504097#Topic/thin_films> ; # Thin films
    schema:about <http://experiment.worldcat.org/entity/work/data/350504097#Topic/science_physics_general> ; # SCIENCE--Physics--General
    schema:about <http://experiment.worldcat.org/entity/work/data/350504097#Topic/science_mechanics_general> ; # SCIENCE--Mechanics--General
    schema:alternateName "Thin film process technology" ;
    schema:alternateName "98/1 reactive sputtering" ;
    schema:bookFormat schema:EBook ;
    schema:datePublished "2018" ;
    schema:description "Cover; Title Page; Copyright Page; Contents; A5: Reactive Sputtering Coordinating; A5.0 Reactive Sputtering: Introduction and General Discussion; A5.1 Reactive pulsed DC magnetron sputtering and control; A5.2 AC and RF reactive sputtering; A5.3 Modeling of the reactive sputtering process; Appendix A: List of Contributors; Index."@en ;
    schema:editor <http://experiment.worldcat.org/entity/work/data/350504097#Person/shah_s_ismat> ; # S. Ismat Shah
    schema:editor <http://experiment.worldcat.org/entity/work/data/350504097#Person/glocker_david_a> ; # David A. Glocker
    schema:editor <http://experiment.worldcat.org/entity/work/data/350504097#Person/westwood_william_d_william_dickson_1937> ; # William Dickson Westwood
    schema:exampleOfWork <http://worldcat.org/entity/work/id/350504097> ;
    schema:genre "Handbooks and manuals"@en ;
    schema:genre "Electronic books"@en ;
    schema:inLanguage "en" ;
    schema:isPartOf <http://experiment.worldcat.org/entity/work/data/350504097#Series/crc_revivals> ; # CRC revivals.
    schema:isSimilarTo <http://worldcat.org/entity/work/data/350504097#CreativeWork/handbook_of_thin_film_process_technology_98_1_reactive_sputtering> ;
    schema:name "Handbook of thin film process technology : 98/1 reactive sputtering"@en ;
    schema:productID "1020688572" ;
    schema:publication <http://www.worldcat.org/title/-/oclc/1020688572#PublicationEvent/boca_raton_fl_crc_press_2018> ;
    schema:publisher <http://experiment.worldcat.org/entity/work/data/350504097#Agent/crc_press> ; # CRC Press
    schema:url <http://public.ebookcentral.proquest.com/choice/publicfullrecord.aspx?p=5228013> ;
    schema:url <https://nls.ldls.org.uk/welcome.html?ark:/81055/vdc_100054746863.0x000001> ;
    schema:url <http://search.ebscohost.com/login.aspx?direct=true&scope=site&db=nlebk&db=nlabk&AN=1693941> ;
    schema:url <http://public.eblib.com/choice/publicfullrecord.aspx?p=5228013> ;
    schema:workExample <http://worldcat.org/isbn/9781351081238> ;
    schema:workExample <http://worldcat.org/isbn/9781351072786> ;
    wdrs:describedby <http://www.worldcat.org/title/-/oclc/1020688572> ;
    .


Related Entities

<http://experiment.worldcat.org/entity/work/data/350504097#Person/glocker_david_a> # David A. Glocker
    a schema:Person ;
    schema:familyName "Glocker" ;
    schema:givenName "David A." ;
    schema:name "David A. Glocker" ;
    .

<http://experiment.worldcat.org/entity/work/data/350504097#Person/shah_s_ismat> # S. Ismat Shah
    a schema:Person ;
    schema:familyName "Shah" ;
    schema:givenName "S. Ismat" ;
    schema:name "S. Ismat Shah" ;
    .

<http://experiment.worldcat.org/entity/work/data/350504097#Person/westwood_william_d_william_dickson_1937> # William Dickson Westwood
    a schema:Person ;
    schema:birthDate "1937" ;
    schema:familyName "Westwood" ;
    schema:givenName "William Dickson" ;
    schema:givenName "William D." ;
    schema:name "William Dickson Westwood" ;
    .

<http://experiment.worldcat.org/entity/work/data/350504097#Place/boca_raton_fl> # Boca Raton, FL
    a schema:Place ;
    schema:name "Boca Raton, FL" ;
    .

<http://experiment.worldcat.org/entity/work/data/350504097#Series/crc_revivals> # CRC revivals.
    a bgn:PublicationSeries ;
    schema:hasPart <http://www.worldcat.org/oclc/1020688572> ; # Handbook of thin film process technology : 98/1 reactive sputtering
    schema:name "CRC revivals." ;
    schema:name "CRC revivals" ;
    .

<http://experiment.worldcat.org/entity/work/data/350504097#Topic/science_mechanics_general> # SCIENCE--Mechanics--General
    a schema:Intangible ;
    schema:name "SCIENCE--Mechanics--General"@en ;
    .

<http://experiment.worldcat.org/entity/work/data/350504097#Topic/science_physics_general> # SCIENCE--Physics--General
    a schema:Intangible ;
    schema:name "SCIENCE--Physics--General"@en ;
    .

<http://experiment.worldcat.org/entity/work/data/350504097#Topic/surfaces_technology> # Surfaces (Technology)
    a schema:Intangible ;
    schema:name "Surfaces (Technology)"@en ;
    .

<http://worldcat.org/entity/work/data/350504097#CreativeWork/handbook_of_thin_film_process_technology_98_1_reactive_sputtering>
    a schema:CreativeWork ;
    rdfs:label "Handbook of Thin Film Process Technology : 98/1 Reactive Sputtering." ;
    schema:description "Print version:" ;
    schema:isSimilarTo <http://www.worldcat.org/oclc/1020688572> ; # Handbook of thin film process technology : 98/1 reactive sputtering
    .

<http://worldcat.org/isbn/9781351072786>
    a schema:ProductModel ;
    schema:isbn "1351072781" ;
    schema:isbn "9781351072786" ;
    .

<http://worldcat.org/isbn/9781351081238>
    a schema:ProductModel ;
    schema:isbn "1351081233" ;
    schema:isbn "9781351081238" ;
    .


Content-negotiable representations

Close Window

Please sign in to WorldCat 

Don't have an account? You can easily create a free account.