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Industrial applications of ultrafast lasers

Author: Richard Haight; Adra V Carr
Publisher: Singapore ; Hackensack, NJ : World Scientific Publishing Co. Pte. Ltd., [2018]
Series: World Scientific series in materials and energy, v. 11.
Edition/Format:   eBook : Document : EnglishView all editions and formats
Summary:
This book describes the application of ultrafast laser science and technology in materials and processing relevant to industry today, including ultrafast laser ablation where fundamental studies have led to the development of the world's first femtosecond photomask repair tool. Semiconductor manufacturing companies worldwide use the tool to repair photomask defects, saving hundreds of millions in production costs.  Read more...
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Genre/Form: Electronic books
Additional Physical Format: Print version:
Haight, Richard.
Industrial applications of ultrafast lasers.
Singapore ; Hackensack, NJ : World Scientific Publishing Co. Pte. Ltd., [2018]
(DLC) 2017054508
(OCoLC)1020293872
Material Type: Document, Internet resource
Document Type: Internet Resource, Computer File
All Authors / Contributors: Richard Haight; Adra V Carr
ISBN: 9789814569019 9814569011 9789814569026 981456902X
OCLC Number: 1040683537
Description: 1 online resource (xii, 193 pages .)
Contents: Ultrafast laser systems --
High-harmonic generation with femtosecond light --
Femtosecond photoelectron spectroscopy: fundamentals and electron dynamics --
Femtosecond ablation and mask repair --
Femtosecond photovoltage spectroscopy and device physics --
Survey of ultrafast light sources, applications, and final thoughts.
Series Title: World Scientific series in materials and energy, v. 11.
Responsibility: Richard Haight, Adra V. Carr, IBM T.J. Watson Research Center, USA.

Abstract:

This book describes the application of ultrafast laser science and technology in materials and processing relevant to industry today, including ultrafast laser ablation where fundamental studies have led to the development of the world's first femtosecond photomask repair tool. Semiconductor manufacturing companies worldwide use the tool to repair photomask defects, saving hundreds of millions in production costs. The most up-to-date ultrafast laser technologies are described and methods to generate high harmonics for photoelectron spectroscopy of industrially important materials are covered, with an emphasis on practical laboratory implementation. Basic device physics merged with photoemission studies from single- and polycrystalline materials are described. Extensions to new methods for extracting key device properties of metal-oxide-semiconductor structures, including band offsets, effective work functions, semiconductor band bending and defect-related charging in a number of technologically important gate oxides are detailed. Polycrystalline photovoltaic materials and heterostructures as well as organic light emitting materials are covered. This book describes both the history, and most recent applications of ultrafast laser science to industrially relevant materials, processes and devices.

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