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Infrared characterization for microelectronics

Author: W S Lau
Publisher: Singapore ; River Edge, NJ : World Scientific, ©1999.
Edition/Format:   Print book : EnglishView all editions and formats
Summary:
"Most of the books on infrared characterization are for applications in chemistry and no book has been dedicated to infrared characterization for microelectronics. The focus of the book will be on practical applications useful to the production line and to the research and development of microelectronics. The background knowledge and significance of doing a particular type of infrared measurement will be discussed  Read more...
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Material Type: Internet resource
Document Type: Book, Internet Resource
All Authors / Contributors: W S Lau
ISBN: 9810223528 9789810223526
OCLC Number: 42296475
Description: x, 160 pages : illustrations ; 23 cm
Contents: Ch. 1. Introduction to Infrared Spectroscopy --
Ch. 2. The Properties of Infrared Transparent Substrates --
Ch. 3. The Measurement of Oxygen and Carbon and Other Impurities in Silicon --
Ch. 4. The Measurement of Epitaxial Layer Thickness --
Ch. 5. The Characterization of Silicon Dioxide and Silicon Nitride Thin Films --
Ch. 6. The Characterization of PSG, BPSG, SOG and Other Glasses --
Ch. 7. The Characterization of Amorphous Silicon and Related Materials --
Ch. 8. Miscellaneous Applications of Infrared Spectroscopy to Microelectronics.
Responsibility: W.S. Lau.

Abstract:

The focus of this text is on practical applications of infrared characterization useful to the production line and to the research and development of microelectronics. The background knowledge and  Read more...

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