skip to content
Ion implantation and beam processing Preview this item
ClosePreview this item
Checking...

Ion implantation and beam processing

Author: James S Williams; J M Poate
Publisher: Sydney ; New York : Academic Press, 1984.
Edition/Format:   Print book : EnglishView all editions and formats
Rating:

(not yet rated) 0 with reviews - Be the first.

Subjects
More like this

Find a copy in the library

&AllPage.SpinnerRetrieving; Finding libraries that hold this item...

Details

Additional Physical Format: Online version:
Ion implantation and beam processing.
Sydney ; New York : Academic Press, 1984
(OCoLC)610182918
Document Type: Book
All Authors / Contributors: James S Williams; J M Poate
ISBN: 0127569804 9780127569802
OCLC Number: 10958087
Description: xi, 419 pages : illustrations ; 24 cm
Contents: Introduction to implantation and beam processing / J.S. Williams, J.M. Poate --
Amorphization and crystallization of semiconductors / J.M. Poate, J.S. Williams --
Applications of the Boltzmann transport equation to ion implantation in semiconductors and multilayer targets / J.F. Gibbons, L.A. Christel --
High energy density collision cascades and spike effects / J.A. Davies --
Implantation of insulators: ices and lithographic materials / W.L. Brown --
Ion-bombardment-induced composition changes in alloys and compounds / Hans Henrik Andersen --
Ion beam and laser mixing: fundamentals and applications / B.R. Appleton --
High-does implantation / D.G. Beanland --
Trends of ion implantation in silicon technology / H.S. Rupprecht, A.E. Michel --
Implantation in Ga AS technology / F.H. Eisen --
Contracts and interconnections on semiconductors / J.E.E. Baglin, H.B. Harrison, J.L. Tandon [and others].
Responsibility: edited by J.S. Williams, J.M. Poate.

Reviews

User-contributed reviews
Retrieving GoodReads reviews...
Retrieving DOGObooks reviews...

Tags

Be the first.
Confirm this request

You may have already requested this item. Please select Ok if you would like to proceed with this request anyway.

Linked Data


Primary Entity

<http://www.worldcat.org/oclc/10958087> # Ion implantation and beam processing
    a schema:Book, schema:CreativeWork ;
    library:oclcnum "10958087" ;
    library:placeOfPublication <http://dbpedia.org/resource/New_York_City> ; # New York
    library:placeOfPublication <http://experiment.worldcat.org/entity/work/data/352280456#Place/sydney> ; # Sydney
    library:placeOfPublication <http://id.loc.gov/vocabulary/countries/xna> ;
    schema:about <http://dewey.info/class/621.38152/e19/> ;
    schema:about <http://id.worldcat.org/fast/978590> ; # Ion implantation
    schema:about <http://experiment.worldcat.org/entity/work/data/352280456#Thing/semiconductors> ; # Semiconductors
    schema:about <http://id.worldcat.org/fast/1112124> ; # Semiconductor doping
    schema:about <http://id.worldcat.org/fast/906654> ; # Electron beams
    schema:about <http://experiment.worldcat.org/entity/work/data/352280456#Topic/faisceaux_electroniques> ; # Faisceaux électroniques
    schema:about <http://id.worldcat.org/fast/978567> ; # Ion bombardment
    schema:about <http://experiment.worldcat.org/entity/work/data/352280456#Topic/semiconducteurs_dopage> ; # Semiconducteurs--Dopage
    schema:about <http://experiment.worldcat.org/entity/work/data/352280456#Topic/ionenimplantation> ; # Ionenimplantation
    schema:about <http://experiment.worldcat.org/entity/work/data/352280456#Topic/ions_implantation> ; # Ions--Implantation
    schema:about <http://experiment.worldcat.org/entity/work/data/352280456#Topic/bombardement_ionique> ; # Bombardement ionique
    schema:bookFormat bgn:PrintBook ;
    schema:contributor <http://viaf.org/viaf/279181155> ; # J. M. Poate
    schema:contributor <http://viaf.org/viaf/94641366> ; # James Stanislaus Williams
    schema:datePublished "1984" ;
    schema:description "Introduction to implantation and beam processing / J.S. Williams, J.M. Poate -- Amorphization and crystallization of semiconductors / J.M. Poate, J.S. Williams -- Applications of the Boltzmann transport equation to ion implantation in semiconductors and multilayer targets / J.F. Gibbons, L.A. Christel -- High energy density collision cascades and spike effects / J.A. Davies -- Implantation of insulators: ices and lithographic materials / W.L. Brown -- Ion-bombardment-induced composition changes in alloys and compounds / Hans Henrik Andersen -- Ion beam and laser mixing: fundamentals and applications / B.R. Appleton -- High-does implantation / D.G. Beanland -- Trends of ion implantation in silicon technology / H.S. Rupprecht, A.E. Michel -- Implantation in Ga AS technology / F.H. Eisen -- Contracts and interconnections on semiconductors / J.E.E. Baglin, H.B. Harrison, J.L. Tandon [and others]."@en ;
    schema:exampleOfWork <http://worldcat.org/entity/work/id/352280456> ;
    schema:inLanguage "en" ;
    schema:isSimilarTo <http://www.worldcat.org/oclc/610182918> ;
    schema:name "Ion implantation and beam processing"@en ;
    schema:productID "10958087" ;
    schema:publication <http://www.worldcat.org/title/-/oclc/10958087#PublicationEvent/sydney_new_york_academic_press_1984> ;
    schema:publisher <http://experiment.worldcat.org/entity/work/data/352280456#Agent/academic_press> ; # Academic Press
    schema:workExample <http://worldcat.org/isbn/9780127569802> ;
    umbel:isLike <http://bnb.data.bl.uk/id/resource/GB8503757> ;
    wdrs:describedby <http://www.worldcat.org/title/-/oclc/10958087> ;
    .


Related Entities

<http://dbpedia.org/resource/New_York_City> # New York
    a schema:Place ;
    schema:name "New York" ;
    .

<http://experiment.worldcat.org/entity/work/data/352280456#Agent/academic_press> # Academic Press
    a bgn:Agent ;
    schema:name "Academic Press" ;
    .

<http://experiment.worldcat.org/entity/work/data/352280456#Thing/semiconductors> # Semiconductors
    a schema:Thing ;
    schema:name "Semiconductors" ;
    .

<http://experiment.worldcat.org/entity/work/data/352280456#Topic/bombardement_ionique> # Bombardement ionique
    a schema:Intangible ;
    schema:name "Bombardement ionique"@fr ;
    .

<http://experiment.worldcat.org/entity/work/data/352280456#Topic/faisceaux_electroniques> # Faisceaux électroniques
    a schema:Intangible ;
    schema:name "Faisceaux électroniques"@fr ;
    .

<http://experiment.worldcat.org/entity/work/data/352280456#Topic/ionenimplantation> # Ionenimplantation
    a schema:Intangible ;
    schema:name "Ionenimplantation"@en ;
    .

<http://experiment.worldcat.org/entity/work/data/352280456#Topic/ions_implantation> # Ions--Implantation
    a schema:Intangible ;
    schema:name "Ions--Implantation"@fr ;
    .

<http://experiment.worldcat.org/entity/work/data/352280456#Topic/semiconducteurs_dopage> # Semiconducteurs--Dopage
    a schema:Intangible ;
    schema:name "Semiconducteurs--Dopage"@fr ;
    .

<http://id.worldcat.org/fast/1112124> # Semiconductor doping
    a schema:Intangible ;
    schema:name "Semiconductor doping"@en ;
    .

<http://id.worldcat.org/fast/906654> # Electron beams
    a schema:Intangible ;
    schema:name "Electron beams"@en ;
    .

<http://id.worldcat.org/fast/978567> # Ion bombardment
    a schema:Intangible ;
    schema:name "Ion bombardment"@en ;
    .

<http://id.worldcat.org/fast/978590> # Ion implantation
    a schema:Intangible ;
    schema:name "Ion implantation"@en ;
    .

<http://viaf.org/viaf/279181155> # J. M. Poate
    a schema:Person ;
    schema:familyName "Poate" ;
    schema:givenName "J. M." ;
    schema:name "J. M. Poate" ;
    .

<http://viaf.org/viaf/94641366> # James Stanislaus Williams
    a schema:Person ;
    schema:birthDate "1948" ;
    schema:familyName "Williams" ;
    schema:givenName "James Stanislaus" ;
    schema:givenName "James S." ;
    schema:name "James Stanislaus Williams" ;
    .

<http://worldcat.org/isbn/9780127569802>
    a schema:ProductModel ;
    schema:isbn "0127569804" ;
    schema:isbn "9780127569802" ;
    .

<http://www.worldcat.org/oclc/610182918>
    a schema:CreativeWork ;
    rdfs:label "Ion implantation and beam processing." ;
    schema:description "Online version:" ;
    schema:isSimilarTo <http://www.worldcat.org/oclc/10958087> ; # Ion implantation and beam processing
    .


Content-negotiable representations

Close Window

Please sign in to WorldCat 

Don't have an account? You can easily create a free account.