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Molecular beam epitaxy : applications to key materials

Author: Robin F C Farrow
Publisher: Park Ridge, NJ : Noyes Publications, 1995.
Series: Materials science and process technology series.
Edition/Format:   Print book : EnglishView all editions and formats
Summary:

Describes the use of molecular beam epitaxy (MBE) for a range of key materials systems that are of interest for both technological and fundamental reasons. This book aims to demonstrate the  Read more...

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Material Type: Internet resource
Document Type: Book, Internet Resource
All Authors / Contributors: Robin F C Farrow
ISBN: 0815513712 9780815513711
OCLC Number: 246829734
Description: XX, 772 Seiten : Illustrationen, Diagramme.
Contents: The Technology and Design of Molecular Beam Epitaxy SystemsMolecular Beam Epitaxy of High-Quality GaAs and AlGaAsGas-Source Molecular Beam Epitaxy: GaxIn1-xAs1-yPy/InP MBE with Non-elemental Sources. Heterostructures and Device PropertiesMolecular Beam Epitaxy of Wide Gap II-VI Semiconductor HeterostructuresElemental Semiconductor HeterostructuresuGrowth, Properties, and ApplicationsMBE Growth of High Tc SuperconductorsMBE Growth of Artificially-Layered Magnetic Metal StructuresReflection High Energy Electron Diffraction Studies of the Dynamics of Molecular Beam EpitaxyAcknowledgmentsAppendix: Two-Level DiffractionReferencesIndex
Series Title: Materials science and process technology series.
Responsibility: ed. by Robin F.C. Farrow.

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..".the basic facts of the technique are laid out...well-known researchers present accounts of the use of MBE for making different types of materials..."-JOM.

 
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