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A numerical and experimental analysis of reactor performance and deposition rates for CVD on monofilaments

Author: S A Gokoglu; United States. National Aeronautics and Space Administration,
Publisher: [Washington, D.C.] : National Aeronautics and Space Administration, [1990?]
Series: NASA technical memorandum, 103631.
Edition/Format:   eBook : Document : National government publication : EnglishView all editions and formats
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Genre/Form: Online resources
Additional Physical Format: Online version :
Gokoglu, S.A.
Numerical and experimental analysis of reactor performance and deposition rates for CVD on monofilaments.
[Washington, D.C.] : National Aeronautics and Space Administration, [1990?]
(OCoLC)1035763334
Material Type: Document, Government publication, National government publication, Internet resource
Document Type: Internet Resource, Computer File
All Authors / Contributors: S A Gokoglu; United States. National Aeronautics and Space Administration,
OCLC Number: 1035764197
Notes: "Prepared for the 11th International Conference on Chemical Vapor Deposition (CVD-XI) sponsored by the Electrochemical Society Seattle, Washington, October 14-19, 1990."
Description: 1 online resource (7 pages) : illustrations.
Series Title: NASA technical memorandum, 103631.
Other Titles: Numerical and experimental analysis of reactor performance and deposition rates for chemical vapor deposition on monofilaments
Responsibility: S.A. Gokoglu [and four others].

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