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Optical microlithography XIX : 21-24 February 2006, San Jose, California, USA

Author: Donis G Flagello; Society of Photo-optical Instrumentation Engineers.; International SEMATECH.
Publisher: Bellingham, Wash. : SPIE, ©2006.
Series: Proceedings of SPIE--the International Society for Optical Engineering, v. 6154.
Edition/Format:   eBook : Document : Conference publication : EnglishView all editions and formats
Summary:

Proceedings of SPIE offer access to the latest innovations in research and technology and are among the most cited references in patent literature.

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Genre/Form: Conference papers and proceedings
Electronic book
Congresses
Additional Physical Format: (OCoLC)70081001
Material Type: Conference publication, Document, Internet resource
Document Type: Internet Resource, Computer File
All Authors / Contributors: Donis G Flagello; Society of Photo-optical Instrumentation Engineers.; International SEMATECH.
ISBN: 0819461970 9780819461971
OCLC Number: 70107210
Reproduction Notes: Electronic reproduction. Bellingham, Wash. : SPIE--the International Society for Optical Engineering, 2006. Mode of access: World Wide Web. Access restricted to SPIE Digital Library subscribers.
Description: 3 volumes : illustrations (some color) ; 28 cm.
Series Title: Proceedings of SPIE--the International Society for Optical Engineering, v. 6154.
Other Titles: SPIE digital library.
Responsibility: Donis G. Flagello, chair/editor ; cooperating organization, SEMSTECH, INC (USA) ; sponsored and published by SPIE--the International Society for Optical Engineering.

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