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Optical microlithography XVI : 25-28 February 2003, Santa Clara, California, USA

Author: Anthony Yen; Society of Photo-optical Instrumentation Engineers.; Semiconductor Equipment and Materials International.; International SEMATECH.
Publisher: Bellingham, Wash. : Society of Photo-optical Instrumentation Engineers, ©2003.
Series: Proceedings of SPIE--the International Society for Optical Engineering, v. 5040.
Edition/Format:   Print book : Conference publication : EnglishView all editions and formats
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Genre/Form: Conference papers and proceedings
Congresses
Material Type: Conference publication, Internet resource
Document Type: Book, Internet Resource
All Authors / Contributors: Anthony Yen; Society of Photo-optical Instrumentation Engineers.; Semiconductor Equipment and Materials International.; International SEMATECH.
ISBN: 0819448451 9780819448453
OCLC Number: 52636014
Description: 3 volumes (xxxi, 1764 pages) : illustrations (some color) ; 28 cm.
Contents: pt. 1. Plenary paper: The end of the semiconductor industry as we know it / C.A. Mack ; Image quality assessment ; Imaging and process simulation ; Advanced image analysis ; Mask-imaging interaction ; DRAM/SRAM/back-end patterning ; Alternating phase-shifting masks ; Techniques for low-k₁ imaging ; Image quality and design rules ; Joint session : Contamination issues in lithography ; Critical dimension control ; Focus monitoring and control ; 157-nm lithography --
pt. 2. Immersion litography ; 157-nm exposure systems and related topics ; Advaned exposure systems and related topics ; Poster session: Process optimization control ; Masks ; Alternating PSM ; OPC ; RET --
pt. 3. Poster session: RET [cont.] ; DRAM and thin film heads ; 157 nm ; Image quality assessment ; Simulation and analysis ; Exposure tools, subsystems, and related topics.
Series Title: Proceedings of SPIE--the International Society for Optical Engineering, v. 5040.
Other Titles: Optical microlithography sixteen
Optical Microlithography 16
Responsibility: Anthony Yen, chair/editor ; sponsored and published by SPIE--the International Society for Optical Engineering ; cooperating organizations, SEMI--Semiconductor Equipment and Materials International, International SEMATECH.

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