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Plasma processing : symposium held April 15-18, 1986, Palo Alto, California, U.S.A. Preview this item
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Plasma processing : symposium held April 15-18, 1986, Palo Alto, California, U.S.A.

Author: J W Coburn; R A Gottscho; Dennis W Hess; Materials Research Society.
Publisher: Pittsburgh, Pa. : Materials Research Society, ©1986.
Series: Materials Research Society symposia proceedings, v. 68.
Edition/Format:   Print book : Conference publication : EnglishView all editions and formats
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Genre/Form: Conference papers and proceedings
Congresses
Additional Physical Format: Online version:
Plasma processing.
Pittsburgh, Pa. : Materials Research Society, ©1986
(OCoLC)567953067
Material Type: Conference publication
Document Type: Book
All Authors / Contributors: J W Coburn; R A Gottscho; Dennis W Hess; Materials Research Society.
ISBN: 0931837340 9780931837340
OCLC Number: 13795753
Description: xvii, 463 pages : illustrations ; 24 cm.
Series Title: Materials Research Society symposia proceedings, v. 68.
Responsibility: editors, J.W. Coburn, R.A. Gottscho, D.W. Hess.

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Primary Entity<\/h3>
<http:\/\/www.worldcat.org\/oclc\/13795753<\/a>> # Plasma processing : symposium held April 15-18, 1986, Palo Alto, California, U.S.A.<\/span>\u00A0\u00A0\u00A0\u00A0a schema:CreativeWork<\/a>, schema:Book<\/a> ;\u00A0\u00A0\u00A0library:oclcnum<\/a> \"13795753<\/span>\" ;\u00A0\u00A0\u00A0library:placeOfPublication<\/a> <http:\/\/experiment.worldcat.org\/entity\/work\/data\/807566848#Place\/pittsburgh_pa<\/a>> ; # Pittsburgh, Pa.<\/span>\u00A0\u00A0\u00A0library:placeOfPublication<\/a> <http:\/\/id.loc.gov\/vocabulary\/countries\/pau<\/a>> ;\u00A0\u00A0\u00A0schema:about<\/a> <http:\/\/experiment.worldcat.org\/entity\/work\/data\/807566848#Topic\/gravure_par_plasma_congres<\/a>> ; # Gravure par plasma--Congr\u00E8s<\/span>\u00A0\u00A0\u00A0schema:about<\/a> <http:\/\/experiment.worldcat.org\/entity\/work\/data\/807566848#Topic\/technique_des_plasmas_congres<\/a>> ; # Technique des plasmas--Congr\u00E8s<\/span>\u00A0\u00A0\u00A0schema:about<\/a> <http:\/\/experiment.worldcat.org\/entity\/work\/data\/807566848#Topic\/plasmas_gaz_ionises_congres<\/a>> ; # Plasmas (gaz ionis\u00E9s)--Congr\u00E8s<\/span>\u00A0\u00A0\u00A0schema:about<\/a> <http:\/\/experiment.worldcat.org\/entity\/work\/data\/807566848#Topic\/plasma_engineering<\/a>> ; # Plasma engineering<\/span>\u00A0\u00A0\u00A0schema:about<\/a> <http:\/\/id.worldcat.org\/fast\/1066322<\/a>> ; # Plasma engineering<\/span>\u00A0\u00A0\u00A0schema:about<\/a> <http:\/\/dewey.info\/class\/621.044\/e19\/<\/a>> ;\u00A0\u00A0\u00A0schema:bookFormat<\/a> bgn:PrintBook<\/a> ;\u00A0\u00A0\u00A0schema:contributor<\/a> <http:\/\/viaf.org\/viaf\/48124498<\/a>> ; # Dennis W. Hess<\/span>\u00A0\u00A0\u00A0schema:contributor<\/a> <http:\/\/viaf.org\/viaf\/70401909<\/a>> ; # R. A. Gottscho<\/span>\u00A0\u00A0\u00A0schema:contributor<\/a> <http:\/\/viaf.org\/viaf\/150083680<\/a>> ; # Materials Research Society.<\/span>\u00A0\u00A0\u00A0schema:contributor<\/a> <http:\/\/viaf.org\/viaf\/108759209<\/a>> ; # J. W. Coburn<\/span>\u00A0\u00A0\u00A0schema:copyrightYear<\/a> \"1986<\/span>\" ;\u00A0\u00A0\u00A0schema:datePublished<\/a> \"1986<\/span>\" ;\u00A0\u00A0\u00A0schema:exampleOfWork<\/a> <http:\/\/worldcat.org\/entity\/work\/id\/807566848<\/a>> ;\u00A0\u00A0\u00A0schema:genre<\/a> \"Conference papers and proceedings<\/span>\"@en<\/a> ;\u00A0\u00A0\u00A0schema:genre<\/a> \"Conference publication<\/span>\"@en<\/a> ;\u00A0\u00A0\u00A0schema:inLanguage<\/a> \"en<\/span>\" ;\u00A0\u00A0\u00A0schema:isPartOf<\/a> <http:\/\/worldcat.org\/issn\/0272-9172<\/a>> ; # Materials Research Society symposia proceedings ;<\/span>\u00A0\u00A0\u00A0schema:isSimilarTo<\/a> <http:\/\/www.worldcat.org\/oclc\/567953067<\/a>> ;\u00A0\u00A0\u00A0schema:name<\/a> \"Plasma processing : symposium held April 15-18, 1986, Palo Alto, California, U.S.A.<\/span>\"@en<\/a> ;\u00A0\u00A0\u00A0schema:productID<\/a> \"13795753<\/span>\" ;\u00A0\u00A0\u00A0schema:publication<\/a> <http:\/\/www.worldcat.org\/title\/-\/oclc\/13795753#PublicationEvent\/pittsburgh_pa_materials_research_society_1986<\/a>> ;\u00A0\u00A0\u00A0schema:publisher<\/a> <http:\/\/experiment.worldcat.org\/entity\/work\/data\/807566848#Agent\/materials_research_society<\/a>> ; # Materials Research Society<\/span>\u00A0\u00A0\u00A0schema:workExample<\/a> <http:\/\/worldcat.org\/isbn\/9780931837340<\/a>> ;\u00A0\u00A0\u00A0wdrs:describedby<\/a> <http:\/\/www.worldcat.org\/title\/-\/oclc\/13795753<\/a>> ;\u00A0\u00A0\u00A0\u00A0.<\/div>

Related Entities<\/h3>
<http:\/\/dewey.info\/class\/621.044\/e19\/<\/a>>\u00A0\u00A0\u00A0\u00A0a schema:Intangible<\/a> ;\u00A0\u00A0\u00A0\u00A0.<\/div>
<http:\/\/experiment.worldcat.org\/entity\/work\/data\/807566848#Agent\/materials_research_society<\/a>> # Materials Research Society<\/span>\u00A0\u00A0\u00A0\u00A0a bgn:Agent<\/a> ;\u00A0\u00A0\u00A0schema:name<\/a> \"Materials Research Society<\/span>\" ;\u00A0\u00A0\u00A0\u00A0.<\/div>
<http:\/\/experiment.worldcat.org\/entity\/work\/data\/807566848#Place\/pittsburgh_pa<\/a>> # Pittsburgh, Pa.<\/span>\u00A0\u00A0\u00A0\u00A0a schema:Place<\/a> ;\u00A0\u00A0\u00A0schema:name<\/a> \"Pittsburgh, Pa.<\/span>\" ;\u00A0\u00A0\u00A0\u00A0.<\/div>
<http:\/\/experiment.worldcat.org\/entity\/work\/data\/807566848#Topic\/gravure_par_plasma_congres<\/a>> # Gravure par plasma--Congr\u00E8s<\/span>\u00A0\u00A0\u00A0\u00A0a schema:Intangible<\/a> ;\u00A0\u00A0\u00A0schema:name<\/a> \"Gravure par plasma--Congr\u00E8s<\/span>\"@en<\/a> ;\u00A0\u00A0\u00A0\u00A0.<\/div>
<http:\/\/experiment.worldcat.org\/entity\/work\/data\/807566848#Topic\/plasma_engineering<\/a>> # Plasma engineering<\/span>\u00A0\u00A0\u00A0\u00A0a schema:Intangible<\/a> ;\u00A0\u00A0\u00A0rdfs:seeAlso<\/a> <http:\/\/id.loc.gov\/authorities\/subjects\/sh2010106562<\/a>> ;\u00A0\u00A0\u00A0schema:name<\/a> \"Plasma engineering<\/span>\"@en<\/a> ;\u00A0\u00A0\u00A0\u00A0.<\/div>
<http:\/\/experiment.worldcat.org\/entity\/work\/data\/807566848#Topic\/plasmas_gaz_ionises_congres<\/a>> # Plasmas (gaz ionis\u00E9s)--Congr\u00E8s<\/span>\u00A0\u00A0\u00A0\u00A0a schema:Intangible<\/a> ;\u00A0\u00A0\u00A0schema:name<\/a> \"Plasmas (gaz ionis\u00E9s)--Congr\u00E8s<\/span>\"@en<\/a> ;\u00A0\u00A0\u00A0\u00A0.<\/div>
<http:\/\/experiment.worldcat.org\/entity\/work\/data\/807566848#Topic\/technique_des_plasmas_congres<\/a>> # Technique des plasmas--Congr\u00E8s<\/span>\u00A0\u00A0\u00A0\u00A0a schema:Intangible<\/a> ;\u00A0\u00A0\u00A0schema:name<\/a> \"Technique des plasmas--Congr\u00E8s<\/span>\"@en<\/a> ;\u00A0\u00A0\u00A0\u00A0.<\/div>
<http:\/\/id.loc.gov\/vocabulary\/countries\/pau<\/a>>\u00A0\u00A0\u00A0\u00A0a schema:Place<\/a> ;\u00A0\u00A0\u00A0dcterms:identifier<\/a> \"pau<\/span>\" ;\u00A0\u00A0\u00A0\u00A0.<\/div>
<http:\/\/id.worldcat.org\/fast\/1066322<\/a>> # Plasma engineering<\/span>\u00A0\u00A0\u00A0\u00A0a schema:Intangible<\/a> ;\u00A0\u00A0\u00A0schema:name<\/a> \"Plasma engineering<\/span>\"@en<\/a> ;\u00A0\u00A0\u00A0\u00A0.<\/div>
<http:\/\/viaf.org\/viaf\/108759209<\/a>> # J. W. Coburn<\/span>\u00A0\u00A0\u00A0\u00A0a schema:Person<\/a> ;\u00A0\u00A0\u00A0schema:birthDate<\/a> \"1932<\/span>\" ;\u00A0\u00A0\u00A0schema:familyName<\/a> \"Coburn<\/span>\" ;\u00A0\u00A0\u00A0schema:givenName<\/a> \"J. W.<\/span>\" ;\u00A0\u00A0\u00A0schema:name<\/a> \"J. W. Coburn<\/span>\" ;\u00A0\u00A0\u00A0\u00A0.<\/div>
<http:\/\/viaf.org\/viaf\/150083680<\/a>> # Materials Research Society.<\/span>\u00A0\u00A0\u00A0\u00A0a schema:Organization<\/a> ;\u00A0\u00A0\u00A0schema:name<\/a> \"Materials Research Society.<\/span>\" ;\u00A0\u00A0\u00A0\u00A0.<\/div>
<http:\/\/viaf.org\/viaf\/48124498<\/a>> # Dennis W. Hess<\/span>\u00A0\u00A0\u00A0\u00A0a schema:Person<\/a> ;\u00A0\u00A0\u00A0schema:familyName<\/a> \"Hess<\/span>\" ;\u00A0\u00A0\u00A0schema:givenName<\/a> \"Dennis W.<\/span>\" ;\u00A0\u00A0\u00A0schema:name<\/a> \"Dennis W. Hess<\/span>\" ;\u00A0\u00A0\u00A0\u00A0.<\/div>
<http:\/\/viaf.org\/viaf\/70401909<\/a>> # R. A. Gottscho<\/span>\u00A0\u00A0\u00A0\u00A0a schema:Person<\/a> ;\u00A0\u00A0\u00A0schema:familyName<\/a> \"Gottscho<\/span>\" ;\u00A0\u00A0\u00A0schema:givenName<\/a> \"R. A.<\/span>\" ;\u00A0\u00A0\u00A0schema:name<\/a> \"R. A. Gottscho<\/span>\" ;\u00A0\u00A0\u00A0\u00A0.<\/div>
<http:\/\/worldcat.org\/isbn\/9780931837340<\/a>>\u00A0\u00A0\u00A0\u00A0a schema:ProductModel<\/a> ;\u00A0\u00A0\u00A0schema:isbn<\/a> \"0931837340<\/span>\" ;\u00A0\u00A0\u00A0schema:isbn<\/a> \"9780931837340<\/span>\" ;\u00A0\u00A0\u00A0\u00A0.<\/div>
<http:\/\/worldcat.org\/issn\/0272-9172<\/a>> # Materials Research Society symposia proceedings ;<\/span>\u00A0\u00A0\u00A0\u00A0a bgn:PublicationSeries<\/a> ;\u00A0\u00A0\u00A0schema:hasPart<\/a> <http:\/\/www.worldcat.org\/oclc\/13795753<\/a>> ; # Plasma processing : symposium held April 15-18, 1986, Palo Alto, California, U.S.A.<\/span>\u00A0\u00A0\u00A0schema:issn<\/a> \"0272-9172<\/span>\" ;\u00A0\u00A0\u00A0schema:name<\/a> \"Materials Research Society symposia proceedings ;<\/span>\" ;\u00A0\u00A0\u00A0schema:name<\/a> \"Materials Research Society symposia proceedings,<\/span>\" ;\u00A0\u00A0\u00A0\u00A0.<\/div>
<http:\/\/www.worldcat.org\/oclc\/567953067<\/a>>\u00A0\u00A0\u00A0\u00A0a schema:CreativeWork<\/a> ;\u00A0\u00A0\u00A0rdfs:label<\/a> \"Plasma processing.<\/span>\" ;\u00A0\u00A0\u00A0schema:description<\/a> \"Online version:<\/span>\" ;\u00A0\u00A0\u00A0schema:isSimilarTo<\/a> <http:\/\/www.worldcat.org\/oclc\/13795753<\/a>> ; # Plasma processing : symposium held April 15-18, 1986, Palo Alto, California, U.S.A.<\/span>\u00A0\u00A0\u00A0\u00A0.<\/div>
<http:\/\/www.worldcat.org\/title\/-\/oclc\/13795753<\/a>>\u00A0\u00A0\u00A0\u00A0a genont:InformationResource<\/a>, genont:ContentTypeGenericResource<\/a> ;\u00A0\u00A0\u00A0schema:about<\/a> <http:\/\/www.worldcat.org\/oclc\/13795753<\/a>> ; # Plasma processing : symposium held April 15-18, 1986, Palo Alto, California, U.S.A.<\/span>\u00A0\u00A0\u00A0schema:dateModified<\/a> \"2018-11-07<\/span>\" ;\u00A0\u00A0\u00A0void:inDataset<\/a> <http:\/\/purl.oclc.org\/dataset\/WorldCat<\/a>> ;\u00A0\u00A0\u00A0\u00A0.<\/div>