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Principles of plasma discharges and materials processing

Author: M A Lieberman; Allan J Lichtenberg
Publisher: Hoboken, N.J. : Wiley-Interscience, ©2005.
Edition/Format:   eBook : Document : English : 2nd edView all editions and formats
Summary:
"The first edition of Principles of Plasma Discharges and Materials Processing, published over a decade ago, was lauded for its complete treatment of both basic plasma physics and industrial plasma processing, quickly becoming the primary reference for students and professionals." "The Second Edition has been carefully updated and revised to reflect recent developments in the field and to further clarify the  Read more...
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Genre/Form: Electronic books
Additional Physical Format: Print version:
Lieberman, M.A. (Michael A.).
Principles of plasma discharges and materials processing.
Hoboken, N.J. : Wiley-Interscience, ©2005
(DLC) 2004058503
(OCoLC)56752658
Material Type: Document, Internet resource
Document Type: Internet Resource, Computer File
All Authors / Contributors: M A Lieberman; Allan J Lichtenberg
ISBN: 0471724246 9780471724247 9780471720010 0471720011 0471724254 9780471724254
OCLC Number: 59760348
Description: 1 online resource (xxxv, 757 pages) : illustrations
Contents: Basic plasma equations and equilibrium --
Atomic collisions --
Plasma dynamics --
Diffusion and transport --
Direct current (DC) sheaths --
Chemical reactions and equilibrium --
Molecular collisions --
Chemical kinetics and surface processes --
Particle and energy balance in discharges --
Capacitive discharges --
Inductive discharges --
Wave-heated discharges --
Direct current (DC) discharges --
Etching --
Deposition and implantation --
Dusty plasmas --
Kinetic theory of discharges.
Responsibility: Michael A. Lieberman, Allan J. Lichtenberg.
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Abstract:

This Second Edition of Principles of Plasma Discharges and Materials Processing is a thorough revision and updating of the very well received first edition of this text.  Read more...

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"The authors have done an excellent job...this is a good book for an academic course that will provide the foundation to senior-level and graduate students..." (MRS Bulletin, November2005)

 
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Primary Entity

<http://www.worldcat.org/oclc/59760348> # Principles of plasma discharges and materials processing
    a schema:CreativeWork, schema:Book, schema:MediaObject ;
    library:oclcnum "59760348" ;
    library:placeOfPublication <http://experiment.worldcat.org/entity/work/data/9438794627#Place/hoboken_n_j> ; # Hoboken, N.J.
    library:placeOfPublication <http://id.loc.gov/vocabulary/countries/nju> ;
    rdfs:comment "Warning: This malformed URI has been treated as a string - 'http://public.eblib.com/choice/publicfullrecord.aspx?p=227410userid=^u'" ;
    schema:about <http://experiment.worldcat.org/entity/work/data/9438794627#Topic/dunne_schicht> ; # Dünne Schicht
    schema:about <http://experiment.worldcat.org/entity/work/data/9438794627#Topic/science_physics_general> ; # SCIENCE--Physics--General
    schema:about <http://experiment.worldcat.org/entity/work/data/9438794627#Topic/dunnschichttechnik> ; # Dünnschichttechnik
    schema:about <http://id.worldcat.org/fast/1066327> ; # Plasma etching
    schema:about <http://experiment.worldcat.org/entity/work/data/9438794627#Topic/tunnfilmsteknik> ; # Tunnfilmsteknik
    schema:about <http://experiment.worldcat.org/entity/work/data/9438794627#Thing/er> ; # ER
    schema:about <http://experiment.worldcat.org/entity/work/data/9438794627#Topic/plasmachemie> ; # Plasmachemie
    schema:about <http://experiment.worldcat.org/entity/work/data/9438794627#Topic/plasmaatzen> ; # Plasmaätzen
    schema:about <http://experiment.worldcat.org/entity/work/data/9438794627#Topic/thin_films_surfaces> ; # Thin films--Surfaces
    schema:about <http://experiment.worldcat.org/entity/work/data/9438794627#Topic/festkorperoberflache> ; # Festkörperoberfläche
    schema:about <http://id.worldcat.org/fast/1066293> ; # Plasma chemistry--Industrial applications
    schema:about <http://dewey.info/class/530.44/e22/> ;
    schema:about <http://experiment.worldcat.org/entity/work/data/9438794627#Topic/science_energy> ; # SCIENCE--Energy
    schema:about <http://id.loc.gov/authorities/subjects/sh85103060> ; # Plasma chemistry--Industrial applications
    schema:about <http://experiment.worldcat.org/entity/work/data/9438794627#Topic/plasmaerzeugung> ; # Plasmaerzeugung
    schema:about <http://experiment.worldcat.org/entity/work/data/9438794627#Topic/science_mechanics_general> ; # SCIENCE--Mechanics--General
    schema:about <http://experiment.worldcat.org/entity/work/data/9438794627#Topic/niederdruckplasma> ; # Niederdruckplasma
    schema:about <http://experiment.worldcat.org/entity/work/data/9438794627#Thing/facsci> ; # FACsci
    schema:about <http://id.worldcat.org/fast/1150040> ; # Thin films--Surfaces
    schema:about <http://id.worldcat.org/fast/1066317> ; # Plasma dynamics
    schema:about <http://experiment.worldcat.org/entity/work/data/9438794627#Topic/plasmadynamik> ; # Plasmadynamik
    schema:about <http://experiment.worldcat.org/entity/work/data/9438794627#Thing/electronic_materials> ; # Electronic Materials.
    schema:author <http://viaf.org/viaf/2803333> ; # Michael A. Lieberman
    schema:author <http://viaf.org/viaf/76416498> ; # Allan J. Lichtenberg
    schema:bookEdition "2nd ed." ;
    schema:bookFormat schema:EBook ;
    schema:copyrightYear "2005" ;
    schema:datePublished "2005" ;
    schema:description "Basic plasma equations and equilibrium -- Atomic collisions -- Plasma dynamics -- Diffusion and transport -- Direct current (DC) sheaths -- Chemical reactions and equilibrium -- Molecular collisions -- Chemical kinetics and surface processes -- Particle and energy balance in discharges -- Capacitive discharges -- Inductive discharges -- Wave-heated discharges -- Direct current (DC) discharges -- Etching -- Deposition and implantation -- Dusty plasmas -- Kinetic theory of discharges."@en ;
    schema:exampleOfWork <http://worldcat.org/entity/work/id/9438794627> ;
    schema:genre "Electronic books"@en ;
    schema:inLanguage "en" ;
    schema:isSimilarTo <http://www.worldcat.org/oclc/56752658> ;
    schema:name "Principles of plasma discharges and materials processing"@en ;
    schema:productID "59760348" ;
    schema:publication <http://www.worldcat.org/title/-/oclc/59760348#PublicationEvent/hoboken_n_j_wiley_interscience_2005> ;
    schema:publisher <http://experiment.worldcat.org/entity/work/data/9438794627#Agent/wiley_interscience> ; # Wiley-Interscience
    schema:reviews <http://www.worldcat.org/title/-/oclc/59760348#Review/1086275401> ;
    schema:url <http://site.ebrary.com/id/10299672> ;
    schema:url <http://www3.interscience.wiley.com/cgi-bin/bookhome/109880578> ;
    schema:url <http://onlinelibrary.wiley.com/book/10.1002/0471724254> ;
    schema:url <https://search.ebscohost.com/login.aspx?direct=true&scope=site&db=nlebk&db=nlabk&AN=130962> ;
    schema:url <http://www.123library.org/book_details/?id=14421> ;
    schema:url <http://public.ebookcentral.proquest.com/choice/publicfullrecord.aspx?p=227410> ;
    schema:url <https://onlinelibrary.wiley.com/doi/book/10.1002/0471724254> ;
    schema:url "http://public.eblib.com/choice/publicfullrecord.aspx?p=227410userid=^u" ;
    schema:url <http://catdir.loc.gov/catdir/enhancements/fy0618/2004058503-t.html> ;
    schema:url <https://doi.org/10.1002/0471724254> ;
    schema:url <http://www.myilibrary.com?id=25507> ;
    schema:url <http://0-onlinelibrary.wiley.com.pugwash.lib.warwick.ac.uk/doi/book/10.1002/0471724254> ;
    schema:url <http://www.dawsonera.com/depp/reader/protected/external/AbstractView/S9780471724247> ;
    schema:url <http://catalogimages.wiley.com/images/db/jimages/9780471720010.jpg> ;
    schema:url <http://public.eblib.com/choice/publicfullrecord.aspx?p=227410> ;
    schema:url <http://catdir.loc.gov/catdir/toc/wiley051/2004058503.html> ;
    schema:workExample <http://worldcat.org/isbn/9780471724247> ;
    schema:workExample <http://worldcat.org/isbn/9780471720010> ;
    schema:workExample <http://dx.doi.org/10.1002/0471724254> ;
    schema:workExample <http://worldcat.org/isbn/9780471724254> ;
    wdrs:describedby <http://www.worldcat.org/title/-/oclc/59760348> ;
    .


Related Entities

<http://experiment.worldcat.org/entity/work/data/9438794627#Agent/wiley_interscience> # Wiley-Interscience
    a bgn:Agent ;
    schema:name "Wiley-Interscience" ;
    .

<http://experiment.worldcat.org/entity/work/data/9438794627#Place/hoboken_n_j> # Hoboken, N.J.
    a schema:Place ;
    schema:name "Hoboken, N.J." ;
    .

<http://experiment.worldcat.org/entity/work/data/9438794627#Thing/electronic_materials> # Electronic Materials.
    a schema:Thing ;
    schema:name "Electronic Materials." ;
    .

<http://experiment.worldcat.org/entity/work/data/9438794627#Topic/dunnschichttechnik> # Dünnschichttechnik
    a schema:Intangible ;
    schema:name "Dünnschichttechnik"@en ;
    .

<http://experiment.worldcat.org/entity/work/data/9438794627#Topic/festkorperoberflache> # Festkörperoberfläche
    a schema:Intangible ;
    schema:name "Festkörperoberfläche"@en ;
    .

<http://experiment.worldcat.org/entity/work/data/9438794627#Topic/niederdruckplasma> # Niederdruckplasma
    a schema:Intangible ;
    schema:name "Niederdruckplasma"@en ;
    .

<http://experiment.worldcat.org/entity/work/data/9438794627#Topic/science_mechanics_general> # SCIENCE--Mechanics--General
    a schema:Intangible ;
    schema:name "SCIENCE--Mechanics--General"@en ;
    .

<http://experiment.worldcat.org/entity/work/data/9438794627#Topic/science_physics_general> # SCIENCE--Physics--General
    a schema:Intangible ;
    schema:name "SCIENCE--Physics--General"@en ;
    .

<http://id.loc.gov/authorities/subjects/sh85103060> # Plasma chemistry--Industrial applications
    a schema:Intangible ;
    schema:name "Plasma chemistry--Industrial applications"@en ;
    .

<http://id.worldcat.org/fast/1066293> # Plasma chemistry--Industrial applications
    a schema:Intangible ;
    schema:name "Plasma chemistry--Industrial applications"@en ;
    .

<http://id.worldcat.org/fast/1066317> # Plasma dynamics
    a schema:Intangible ;
    schema:name "Plasma dynamics"@en ;
    .

<http://id.worldcat.org/fast/1066327> # Plasma etching
    a schema:Intangible ;
    schema:name "Plasma etching"@en ;
    .

<http://id.worldcat.org/fast/1150040> # Thin films--Surfaces
    a schema:Intangible ;
    schema:name "Thin films--Surfaces"@en ;
    .

<http://viaf.org/viaf/2803333> # Michael A. Lieberman
    a schema:Person ;
    schema:familyName "Lieberman" ;
    schema:givenName "Michael A." ;
    schema:givenName "M. A." ;
    schema:name "Michael A. Lieberman" ;
    .

<http://viaf.org/viaf/76416498> # Allan J. Lichtenberg
    a schema:Person ;
    schema:familyName "Lichtenberg" ;
    schema:givenName "Allan J." ;
    schema:name "Allan J. Lichtenberg" ;
    .

<http://worldcat.org/isbn/9780471720010>
    a schema:ProductModel ;
    schema:isbn "0471720011" ;
    schema:isbn "9780471720010" ;
    .

<http://worldcat.org/isbn/9780471724247>
    a schema:ProductModel ;
    schema:isbn "0471724246" ;
    schema:isbn "9780471724247" ;
    .

<http://worldcat.org/isbn/9780471724254>
    a schema:ProductModel ;
    schema:isbn "0471724254" ;
    schema:isbn "9780471724254" ;
    .

<http://www.worldcat.org/oclc/56752658>
    a schema:CreativeWork ;
    rdfs:label "Principles of plasma discharges and materials processing." ;
    schema:description "Print version:" ;
    schema:isSimilarTo <http://www.worldcat.org/oclc/59760348> ; # Principles of plasma discharges and materials processing
    .

<http://www.worldcat.org/title/-/oclc/59760348#Review/1086275401>
    a schema:Review ;
    schema:itemReviewed <http://www.worldcat.org/oclc/59760348> ; # Principles of plasma discharges and materials processing
    schema:reviewBody ""The first edition of Principles of Plasma Discharges and Materials Processing, published over a decade ago, was lauded for its complete treatment of both basic plasma physics and industrial plasma processing, quickly becoming the primary reference for students and professionals." "The Second Edition has been carefully updated and revised to reflect recent developments in the field and to further clarify the presentation of basic principles. Along with in-depth coverage of the fundamentals of plasma physics and chemistry, the authors apply basic theory to plasma discharges, including calculations of plasma parameters and the scaling of plasma parameters with control parameters." "With new chapters on dusty plasmas and the kinetic theory of discharges, graduate students and researchers in the field of plasma processing should find this new edition more valuable than ever."--Jacket." ;
    .

<https://doi.org/10.1002/0471724254>
    rdfs:comment "Full text available from Wiley InterScience" ;
    .


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