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Thin film processes II

Author: John L Vossen; Werner Kern
Publisher: Boston : Academic Press, ©1991.
Series: Thin film processes, 2
Edition/Format:   eBook : Document : EnglishView all editions and formats
Summary:
This sequel to the 1978 classic, Thin Film Processes, gives a clear, practical exposition of important thin film deposition and etching processes that have not yet been adequately reviewed. It discusses selected processes in tutorial overviews with implementation guide lines and an introduction to the literature. Though edited to stand alone, when taken together, Thin Film Processes II and its predecessor present a  Read more...
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Genre/Form: Electronic books
Additional Physical Format: Print version:
Thin film processes II.
Boston : Academic Press, ©1991
(DLC) 90020758
(OCoLC)22623928
Material Type: Document, Internet resource
Document Type: Internet Resource, Computer File
All Authors / Contributors: John L Vossen; Werner Kern
ISBN: 9781601192905 1601192908
OCLC Number: 144646036
Description: 1 online resource (xiii, 866 pages) : illustrations.
Contents: Glow discharge plasmas and sources for etching and deposition / Stephen M. Rossnagel --
Evaporation processes / Chandra Deshpandey and Rointan Bunshah --
Molecular beam epitaxy / Peter P. Chow --
Sputter deposition processes / Robert Parsons --
The cathodic arc plasma deposition of thin films / Philip C. Johnson --
Thermal chemical vapor deposition / Klavs F. Jensen and Werner Kern --
OMVPE of compound semiconductors / Thomas F. Kuech and Klavs F. Jensen --
Photochemical vapor deposition / J. Gary Eden --
Sol-gel coatings / Lisa C. Klein --
Plasma-enhanced chemical vapor deposition / Rafael Reif and Werner Kern --
Formation of inorganic films by remote plasma-enhanced chemical-vapor deposition / G. Lucovsky [and others] --
Selected area processing / Thomas M. Mayer and Susan D. Allen --
Plasma-assisted etching / Hans W. Lehmann. Ion beam etching / P. Reese Puckett, Stephen L. Michel, and William E. Hughes --
Laser-driven etching / Carol I.H. Ashby.
Series Title: Thin film processes, 2
Other Titles: Thin film processes two
Responsibility: edited by John L. Vossen, Werner Kern.
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Abstract:

Gives a practical exposition of important thin film deposition and etching processes. This book discusses selected processes in tutorial overviews with implementation guide lines and an introduction  Read more...

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"The editors are to be commended for producing an excellent text that should prove to be as popular as their first volume published over 20 years ago." --George H. Sigel, Jr. in OPTICS & PHOTONICS Read more...

 
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