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Thin film processes

Author: John L Vossen; Werner Kern
Publisher: New York : Academic Press, 1978.
Edition/Format:   Print book : EnglishView all editions and formats
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Genre/Form: Electronic books
Additional Physical Format: Online version:
Thin film processes.
New York : Academic Press, 1978
(OCoLC)567791296
Material Type: Internet resource
Document Type: Book, Internet Resource
All Authors / Contributors: John L Vossen; Werner Kern
ISBN: 0127282505 9780127282503
OCLC Number: 4056878
Description: xi, 564 pages : illustrations ; 24 cm
Contents: Machine derived contents note: Table of contents for Thin film processes / edited by John L. Vossen, Werner Kern. --
Bibliographic record and links to related information available from the Library of Congress catalog --
Information from electronic data provided by the publisher. May be incomplete or contain other coding. --
Introduction.<$> J.L. Vossen, <$> Physical Methods of Film Deposition.<$> J.L. Vossen and J.J. Cuomo, <$> Glow Discharge Sputter Deposition. J.A. Thornton and A.S. Penfold, <$> Cylindrical Magnetron Sputtering. D.B. Fraser, <$> The Sputter and S-Gun Magnetrons. R.K. Waits, <$> Planar Magnetron Sputtering. J.M.E. Harper, <$> Ion Beam Deposition. Chemical Methods of Film Deposition.<$> F.A. Lowenheim, <$> Deposition of Inorganic Films from Solution. W. Kern and V.S. Ban, <$> Chemical Vapor Deposition of Inorganic Thin Films. Physical-Chemical Methods of Film Deposition<$> J.R. Hollahan and R.S. Rosler, <$> Plasma Deposition of Inorganic Thin Films. H. Yasuda, <$> Glow Discharge Polymerization. Etching Processes.<$> W. Kern and C.A. Deckert, <$> Chemical Etching. C.M. Melliar-Smith and C.J. Mogab, <$> Plasma-Assisted Etching Techniques for Pattern Delineation. References. Index. --
Library of Congress subject headings for this publication: Thin films.
Responsibility: edited by John L. Vossen, Werner Kern.
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